发明公开
- 专利标题: GaN SEMICONDUCTOR DEVICE
- 专利标题(中): GAN-HALBLEITERBAUELEMENT
-
申请号: EP05736664.3申请日: 2005-05-02
-
公开(公告)号: EP1744371A1公开(公告)日: 2007-01-17
- 发明人: IKEDA, Nariaki, c/o THE FURUKAWA ELECTRIC CO., LTD , LI, Jiang, c/o THE FURUKAWA ELECTRIC CO., LTD. , YOSHIDA, Seikoh c/o THE FURUKAWA ELECTRIC CO., LTD
- 申请人: The Furukawa Electric Co., Ltd.
- 申请人地址: 2-3 Marunouchi 2-chome Chiyoda-ku, Tokyo 100-8322 JP
- 专利权人: The Furukawa Electric Co., Ltd.
- 当前专利权人: The Furukawa Electric Co., Ltd.
- 当前专利权人地址: 2-3 Marunouchi 2-chome Chiyoda-ku, Tokyo 100-8322 JP
- 代理机构: Böck, Bernhard
- 优先权: JP2004135648 20040430
- 国际公布: WO2005106959 20051110
- 主分类号: H01L29/47
- IPC分类号: H01L29/47 ; H01L29/872
摘要:
A GaN semiconductor device which has a low on-resistance, has a very small leak current when a reverse bias voltage is applied and is very excellent in withstand voltage characteristic, said GaN semiconductor device having a structure being provided with a III-V nitride semiconductor layer containing at least one hetero junction structure of III-V nitride semiconductors having different band gap energies; a first anode electrode arranged on a surface of said III-V nitride semiconductor by Schottky junction; a second anode electrode which is arranged on the surface of said III- V nitride semiconductor layer by Schottky junction, is electrically connected with said first anode electrode and forms a higher Schottky barrier than a Schottky barrier formed by said first anode electrode; and an insulating protection film which is brought into contact with said second anode electrode and is arranged on the surface of said III-V nitride semiconductor layer.
信息查询
IPC分类: