发明公开
EP1764822A3 RF powered plasma enhanced chemical vapour deposition reactor and methods of effecting plasma enhanced chemical vapour deposition
审中-公开
反应器为射频供电等离子体活化化学气相沉积和用于执行所述的沉积方法
- 专利标题： RF powered plasma enhanced chemical vapour deposition reactor and methods of effecting plasma enhanced chemical vapour deposition
- 专利标题（中）： 反应器为射频供电等离子体活化化学气相沉积和用于执行所述的沉积方法
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申请号： EP06023795.5申请日： 1999-02-16
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公开(公告)号： EP1764822A3公开(公告)日： 2008-01-23
- 发明人: Sharan, Sujit , Sandhu, Gurtej S. , Smith, Paul , Chang, Mei
- 申请人： Micron Technology, Inc. , Applied Materials, Inc.
- 申请人地址： 8000 South Federal Way Boise, ID 83706 US
- 专利权人： Micron Technology, Inc.,Applied Materials, Inc.
- 当前专利权人： Micron Technology, Inc.,Applied Materials, Inc.
- 当前专利权人地址： 8000 South Federal Way Boise, ID 83706 US
- 代理机构： Somervell, Thomas Richard
- 优先权： US26042 19980219
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; C23C16/505
摘要：
A reactor comprises a chamber (31) defining a processing volume. A first electrode (32) is disposed inside the chamber and a second electrode (34) outside the chamber. A transformer has an input side and an output side, the input side being connected to and receiving power generated by, an RF power generator. The output side has at least one output terminal connected to the first electrode (32) and at least one other output terminal connected to the second electrode (34). The output side provides power to each of the first and second electrodes in accordance with a selected power ratio.
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