发明公开
- 专利标题： LITHOGRAPHIC PRINTING PLATES WITH HIGH PRINT RUN STABILITY
- 专利标题（中）： 平版印刷版的高稳定性版
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申请号： EP05774698.4申请日： 2005-07-14
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公开(公告)号： EP1774404A2公开(公告)日： 2007-04-18
- 发明人: TIMPE, Hans-Joachim , MÜLLER, Ursula
- 申请人： Kodak Polychrome Graphics GmbH
- 申请人地址： An der Bahn 80 37520 Osterode/Harz DE
- 专利权人： Kodak Polychrome Graphics GmbH
- 当前专利权人： Kodak Polychrome Graphics GmbH
- 当前专利权人地址： An der Bahn 80 37520 Osterode/Harz DE
- 代理机构： Vossius & Partner
- 优先权： DE102004034362 20040716
- 国际公布： WO2006008073 20060126
- 主分类号： G03F7/00
- IPC分类号： G03F7/00
摘要：
Radiation-sensitive element comprising (a) an optionally pretreated substrate and (b) a radiation-sensitive coating consisting of a composition comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one radiation-sensitive initiator or initiator system for free-radical polymerization absorbing radiation selected from the wavelength range of 300 to 1,200 nm; and (iii) at least one silsesquioxane comprising at least one substituent with at least one ethylenically unsaturated group each; applied onto the substrate.
公开/授权文献
- EP1774404B1 LITHOGRAPHIC PRINTING PLATES WITH HIGH PRINT RUN STABILITY 公开/授权日：2008-09-17
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