发明公开
EP1774538A2 MULTIPLE GAS INJECTION SYSTEM FOR CHARGED PARTICLE BEAM INSTRUMENTS 审中-公开
多气体注入系统带电粒子光束INSTRUMENTS

  • 专利标题: MULTIPLE GAS INJECTION SYSTEM FOR CHARGED PARTICLE BEAM INSTRUMENTS
  • 专利标题(中): 多气体注入系统带电粒子光束INSTRUMENTS
  • 申请号: EP05810798.8
    申请日: 2005-07-21
  • 公开(公告)号: EP1774538A2
    公开(公告)日: 2007-04-18
  • 发明人: Moore, Thomas, M.
  • 申请人: Omniprobe, Inc.
  • 申请人地址: 10410 Miller Road Dallas, TX 75238 US
  • 专利权人: Omniprobe, Inc.
  • 当前专利权人: Omniprobe, Inc.
  • 当前专利权人地址: 10410 Miller Road Dallas, TX 75238 US
  • 代理机构: Schmitz, Jean-Marie
  • 优先权: US592103P 20040729
  • 国际公布: WO2006025968 20060309
  • 主分类号: G21K7/00
  • IPC分类号: G21K7/00
MULTIPLE GAS INJECTION SYSTEM FOR CHARGED PARTICLE BEAM INSTRUMENTS
摘要:
We disclose a gas injection system having at least one crucible, each crucible holding at least one deposition constituent; at least one transfer tube, the number of transfer tubes corresponding to the number of crucibles, each transfer tube being connected to a corresponding crucible. There is at least one metering valve, the number of metering valves corresponding to the number of transfer tubes, each metering valve being connected to a corresponding transfer tube so that the metering valve can measure and adjust vapor flow in the corresponding transfer tube. A sensor is provided capable of sensing reactions between deposition constituents and a focused ion beam A computer is connected to receive the output of the sensor; the computer is also connected to each metering valve to control the operation of the valve, and the computer is programmed to send control signals to each metering valve to control the operation of the valve; the control signals being computed responsive to feedback from the output of the sensor.
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