发明公开
- 专利标题: Semiconductor device and method for fabricating the same
- 专利标题(中): 半导体器件及其制造方法
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申请号: EP07002101.9申请日: 2000-04-11
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公开(公告)号: EP1780589A3公开(公告)日: 2013-10-16
- 发明人: Yamazaki, Shunpei , Koyama, Jun , Takayama, Toru , Hamatani, Toshiji
- 申请人: Semiconductor Energy Laboratory Co., Ltd.
- 申请人地址: 398 Hase Atsugi-shi, Kanagawa-ken 243-0036 JP
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: 398 Hase Atsugi-shi, Kanagawa-ken 243-0036 JP
- 代理机构: Grünecker, Kinkeldey, Stockmair & Schwanhäusser
- 优先权: JP10464699 19990412
- 主分类号: H01L29/786
- IPC分类号: H01L29/786 ; H01L21/336 ; H01L29/423 ; H01L29/49 ; G02F1/1362 ; H01L27/12
摘要:
The invention primarily provides gate electrodes and gate wirings permitting large-sized screens for active matrix-type display devices, wherein, in order to achieve this object, the construction of the invention is a semiconductor device having, on the same substrate, a pixel TFT provided in a display region and a driver circuit TFT provided around the display region, wherein the gate electrodes of the pixel TFT and the driver circuit TFT are formed from a first conductive layer, the gate electrodes are in electrical contact through connectors with gate wirings formed from a second conductive layer, and the connectors are provided outside the channel-forming regions of the pixel TFT and the driver circuit TFT.
公开/授权文献
- EP1780589A2 Semiconductor device and method for fabricating the same 公开/授权日:2007-05-02
信息查询
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