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EP1811341A1 Positive photosensitive composition and method of forming pattern using the same 有权
Zusammensetzung und Verfahren zur Strukturformung damit

Positive photosensitive composition and method of forming pattern using the same
摘要：
A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations:

wherein Xa 1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A 1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa 2 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A 2 represents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.
摘要（中）：

正型感光性组合物包括：通过酸的作用使碱性显影液中的溶解速度增加的树脂（A），含有通式（I）表示的酸分解重复单元的树脂（A）和酸不分解性 由通式（II）表示的重复单元; 以及能够在照射活性射线和辐射之一时产生酸的化合物（B）：其中Xa 1表示氢原子，烷基，氰基和卤素原子中的一个，A 1表示 单键和二价连接基团，ALG表示离去烃基的酸，Xa 2表示氢原子，烷基，氰基和卤素原子中的一个，A 2表示单键和二价连接 组，ACG表示酸性非离子性烃基。

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