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    Positive resist composition and pattern forming method using the same
    2.
    发明公开
    Positive resist composition and pattern forming method using the same 审中-公开
    正光刻胶组合物及使用其的图案形成方法

    公开(公告)号：EP1835342A3

    公开(公告)日：2008-06-04

    申请号：EP07005158.6

    申请日：2007-03-13

    申请人： FUJIFILM Corporation

    发明人： Mizutani, Kazuyoshi ,  Iwato, Kaoru ,  Kodama, Kunihiko ,  Tsuchihashi, Toru

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

    摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation:

    wherein AR represents an aryl group; Rn represents an alkyl group, a cycloalkyl group or an aryl group; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

    摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）在用光化射线或辐射照射时能够产生酸的化合物：其中AR表示芳基; Rn表示烷基，环烷基或芳基; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

    Positive resist composition and pattern forming method using the same
    3.
    发明公开
    Positive resist composition and pattern forming method using the same 有权
    积极的抵抗力和威尔法罕zur Strukturformung damit

    公开(公告)号：EP1835341A1

    公开(公告)日：2007-09-19

    申请号：EP07005155.2

    申请日：2007-03-13

    申请人： FUJIFILM Corporation

    发明人： Mizutani, Kazuyoshi ,  Iwato, Kaoru ,  Kodama, Kunihiko ,  Makino, Masaomi

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

    摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation:

    wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

    摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

    Positive photosensitive composition and method of forming pattern using the same
    4.
    发明公开
    Positive photosensitive composition and method of forming pattern using the same 有权
    Zusammensetzung und Verfahren zur Strukturformung damit

    公开(公告)号：EP1811341A1

    公开(公告)日：2007-07-25

    申请号：EP07001487.3

    申请日：2007-01-24

    申请人： Fujifilm Corporation

    发明人： Takahashi, Hyou ,  Sugimoto, Naoya ,  Kodama, Kunihiko ,  Yamamoto, Kei

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0397 ,  C08F224/00 ,  G03F7/26 ,  G03F7/38 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations:

    wherein Xa 1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A 1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa 2 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A 2 represents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.

    摘要翻译： 正型感光性组合物包括：通过酸的作用使碱性显影液中的溶解速度增加的树脂（A），含有通式（I）表示的酸分解重复单元的树脂（A）和酸不分解性 由通式（II）表示的重复单元; 以及能够在照射活性射线和辐射之一时产生酸的化合物（B）：其中Xa 1表示氢原子，烷基，氰基和卤素原子中的一个，A 1表示 单键和二价连接基团，ALG表示离去烃基的酸，Xa 2表示氢原子，烷基，氰基和卤素原子中的一个，A 2表示单键和二价连接 组，ACG表示酸性非离子性烃基。

    Positive photosensitive composition and pattern forming method using the same
    6.
    发明公开
    Positive photosensitive composition and pattern forming method using the same 有权
    正感光组合物及使用其的图案形成方法

    公开(公告)号：EP1767993A1

    公开(公告)日：2007-03-28

    申请号：EP06019979.1

    申请日：2006-09-25

    申请人： FUJIFILM Corporation

    发明人： Nishiyama, Fumiyuki ,  Kodama, Kunihiko

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0397 ,  G03F7/2041

    摘要： A positive photosensitive composition comprising: a resin which comprises a repeating unit having a diamantane structure and decomposes under an action of an acid to increase a solubility in an alkali developer; a compound capable of generating an acid upon irradiation with actinic rays or radiation; a compound represented by the following formula (1); and a solvent:

    wherein R 1 represents a hydrogen atom or an alkyl group, m represents an integer of from 1 to 30, n represents an integer of from 0 to 3, and p represents an integer of from 0 to 5.

    摘要翻译： 一种正型感光性组合物，其特征在于，含有：树脂，其含有具有金刚双胺结构的重复单元，在酸的作用下分解而提高对碱显影液的溶解性; 在用光化射线或辐射照射时能够产生酸的化合物; 由下式（1）表示的化合物; 和溶剂：其中R 1表示氢原子或烷基，m表示1至30的整数，n表示0至3的整数，并且p表示0至5的整数。