发明公开
- 专利标题： METHOD FOR FORMING ANTI-REFLECTIVE COATING
- 专利标题（中）： 形成抗反射涂层的方法
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申请号： EP05801134.7申请日： 2005-09-29
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公开(公告)号： EP1825329A1公开(公告)日： 2007-08-29
- 发明人: FU, Peng-Fei , MOYER, Eric, Scott , YEAKLE, Craig, Rollin
- 申请人： Dow Corning Corporation
- 申请人地址： 2200 West Salzburg Road, P.O. Box 994 Midland, MI 48686-0994 US
- 专利权人： Dow Corning Corporation
- 当前专利权人： Dow Corning Corporation
- 当前专利权人地址： 2200 West Salzburg Road, P.O. Box 994 Midland, MI 48686-0994 US
- 代理机构： Kyle, Diana
- 优先权： US636957P 20041217
- 国际公布： WO2006065320 20060622
- 主分类号： G03F7/09
- IPC分类号： G03F7/09 ; C09D183/04 ; C09D183/06 ; C08G77/12 ; G03F7/075
摘要：
A method of forming an antireflective coating on an electronic device comprising (A) applying to an electronic device an ARC composition comprising (i) a silsesquioxane resin having the formula (PhSiO(3-x)/2(OHx)mHSiO(3-x)/2(OH)x)n, where Ph is a phenyl group, x has a value of 0, 1 or 2; m has a value of 0.05 to 0.95, n has a value of 0.05 to 0.95 and m + n ≈ 1; and (ii) a solvent; and (B) removing the solvent and curing the silsesquioxane resin to form an antireflective coating on the electronic device.
公开/授权文献
- EP1825329B1 METHOD FOR FORMING ANTI-REFLECTIVE COATING 公开/授权日：2015-04-08
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