摘要:
A method of forming an antireflective coating on an electronic device comprising (A) applying to an electronic device an ARC composition comprising (i) a silsesquioxane resin having the formula (PhSiO(3-x)/2(OHx)mHSiO(3-x)/2(OH)x)n, where Ph is a phenyl group, x has a value of 0, 1 or 2; m has a value of 0.05 to 0.95, n has a value of 0.05 to 0.95 and m + n ≈ 1; and (ii) a solvent; and (B) removing the solvent and curing the silsesquioxane resin to form an antireflective coating on the electronic device.
摘要:
A material composition, which is used as a liquid resist, includes a first component comprising a monomer portion and at least one cationically polymerizable functional group, and a crosslinker reactive with the first component and comprising at least three cationically polymerizable functional groups. The material composition also includes a cationic photoinitiator. Upon exposure to UV light, the material composition crosslinks via cure to form a cured resist film that is the reaction product of the first component, the crosslinker, and the cationic photoinitiator. An article includes a substrate layer and a resist layer formed on the substrate layer from the material composition.
摘要:
Provided in various embodiments are methods for making functional silicate MT'Q, MD'Q, and MM'Q resin compositions and the functional silicate resin compositions prepared by such methods. The functional silicate resin compositions may be used in, for example, coatings, rubbers, sealants, antifoams, paints, electronics, personal care items, medical devices and the like.
摘要:
Antireflective coatings produced from silsesquioxane resin comprises the units (Ph(CH2)rSiO(3-x)/2(OR′)x)m (HSiO(3-x)/2(OR′)x)n (MeSiO(3-x)/2(OR′)x)o (RSiO(3-x)/2(OR′)x)p (R1SiO(3-x)/2(OR′)x)q where Ph is a phenyl group, Me is a methyl group; R′ is hydrogen atom or a hydrocarbon group having from 1 to 4 carbon atoms; R is selected from a carboxylic acid group or a carboxylic acid forming group with the proviso that there is a sufficient amount of carboxylic acid groups to make the resin wet etchable after cure; and R1 is selected from substituted phenyl groups, ester groups, polyether groups; mercapto groups, sulfur-containing organic functional groups, hydroxyl producing group, aryl sulphonic ester groups, and reactive or curable organic functional groups; and r has a value of 0, 1, 2, 3, or 4; x has a value of 0, 1 or 2; wherein in the resin m has a value of 0 to 0.90; n has a value of 0.05 to 0.99; o has a value of 0 to 0.95; p has a value of 0.01 to 0.5; q has a value of 0 to 0.5; and m+n+o+p+q≈1.
摘要:
Provided in various embodiments are methods for making ultraviolet radiation curable (UV-curable) silicone compositions and the UV-curable silicone compositions prepared by such methods. Provided in various embodiments are methods for making anti-dust coatings using such UV-curable silicone compositions and the anti-dust coatings using such UV-curable silicone compositions prepared by such methods. The UV-curable silicone compositions may be used in the coating of silicone-based articles for LED packages, encapsulants, lamps, luminaires, optical articles and the like, substantially reducing and/or eliminating the pick-up of dust and improving optical properties of the silicone-based articles.
摘要:
A method of preparing a DIABS-based silsesquioxane resin for use in an antireflective hard-mask coating for photolithography is provided. Methods of preparing an antireflective coating from the DIABS-based silsesquioxane resin and using said antireflective coating in photolithography is alternatively presented. The DIABS-based silsequioxane resin has structural units formed from the hydrolysis and condensation of silane monomers including di-t-butoxydiacetoxysilane (DIABS) and at least one selected from the group of R 1 SiX 3 , R 2 SiX 3 , R 3 SiX 3 , and SiX 4 with water; wherein R 1 is H or an alkyl group, X is a halide or an alkoxy group, R 2 is a chromophore moiety, and R 3 is a reactive site or crosslinking site. The DIABS-based silsesqioxane resin is characterized by the presence of at least one tetra-functional SiO 4/2 unit formed via the hydrolysis of di-t-butoxydiacetoxysilane (DIABS).
摘要:
Methods for producing a silyl-functionalized polyolefin with silyl monomer incorporation are provided. The method includes reacting a silicon-containing olefin with an α-olefin, in the presence of a catalytic amount of a group IV catalyst for a time sufficient to produce a silyl-functionalized polyolefin.
摘要:
A material composition, which is used as a liquid resist, includes a first component comprising a monomer portion and at least one cationically polymerizable functional group, and a crosslinker reactive with the first component and comprising at least three cationically polymerizable functional groups. The material composition also includes a cationic photoinitiator. Upon exposure to UV light, the material composition crosslinks via cure to form a cured resist film that is the reaction product of the first component, the crosslinker, and the cationic photoinitiator. An article includes a substrate layer and a resist layer formed on the substrate layer from the material composition.
摘要:
A method of forming an antireflective coating on an electronic device comprising (A) applying to an electronic device an ARC composition comprising (i) a silsesquioxane resin having the formula (PhSiO(3-X)/2(OH)x)mHSiO(3-x)/2(OH)x)N(MeSiO(3-x)/2(OH)x)p where Ph is a phenyl group, Me is a methyl group, x has a value of 0, 1 or 2; m has a value of 0.05 to 0.95, n has a value of 0.05 to 0.95, p has a value of 0.05 to 0.95, and m+n+p≈1; and (ii) a solvent; and (B) removing the solvent and curing the silsesquioxane resin to form an antireflective coating on the electronic device.
摘要:
Provided in various embodiments are methods for making ultraviolet radiation curable (UV-curable) silicone compositions and the UV-curable silicone compositions prepared by such methods. Provided in various embodiments are methods for making anti-dust coatings using such UV-curable silicone compositions and the anti-dust coatings using such UV-curable silicone compositions prepared by such methods. The UV-curable silicone compositions may be used in the coating of silicone-based articles for LED packages, encapsulants, lamps, luminaires, optical articles and the like, substantially reducing and/or eliminating the pick-up of dust and improving optical properties of the silicone-based articles.