METHOD FOR FORMING ANTI-REFLECTIVE COATING
    1.
    发明公开
    METHOD FOR FORMING ANTI-REFLECTIVE COATING 有权
    形成抗反射涂层的方法

    公开(公告)号:EP1825329A1

    公开(公告)日:2007-08-29

    申请号:EP05801134.7

    申请日:2005-09-29

    摘要: A method of forming an antireflective coating on an electronic device comprising (A) applying to an electronic device an ARC composition comprising (i) a silsesquioxane resin having the formula (PhSiO(3-x)/2(OHx)mHSiO(3-x)/2(OH)x)n, where Ph is a phenyl group, x has a value of 0, 1 or 2; m has a value of 0.05 to 0.95, n has a value of 0.05 to 0.95 and m + n ≈ 1; and (ii) a solvent; and (B) removing the solvent and curing the silsesquioxane resin to form an antireflective coating on the electronic device.

    摘要翻译: 一种在电子器件上形成抗反射涂层的方法,包括:(A)向电子器件施加ARC组合物,该ARC组合物包含(i)具有式(PhSiO(3-x)/ 2(OHx)mHSiO(3-x )/ 2(OH)x)n,其中Ph为苯基,x具有0,1或2的值; m具有0.05至0.95的值,n具有0.05至0.95的值并且m +n≈1; 和(ii)溶剂; 和(B)除去溶剂并固化倍半硅氧烷树脂以在电子器件上形成抗反射涂层。

    WET-ETCHABLE ANTIREFLECTIVE COATINGS
    4.
    发明公开
    WET-ETCHABLE ANTIREFLECTIVE COATINGS 有权
    可湿性抗反射涂料

    公开(公告)号:EP2376584A1

    公开(公告)日:2011-10-19

    申请号:EP09832279.5

    申请日:2009-10-19

    摘要: Antireflective coatings produced from silsesquioxane resin comprises the units (Ph(CH2)rSiO(3-x)/2(OR′)x)m (HSiO(3-x)/2(OR′)x)n (MeSiO(3-x)/2(OR′)x)o (RSiO(3-x)/2(OR′)x)p (R1SiO(3-x)/2(OR′)x)q where Ph is a phenyl group, Me is a methyl group; R′ is hydrogen atom or a hydrocarbon group having from 1 to 4 carbon atoms; R is selected from a carboxylic acid group or a carboxylic acid forming group with the proviso that there is a sufficient amount of carboxylic acid groups to make the resin wet etchable after cure; and R1 is selected from substituted phenyl groups, ester groups, polyether groups; mercapto groups, sulfur-containing organic functional groups, hydroxyl producing group, aryl sulphonic ester groups, and reactive or curable organic functional groups; and r has a value of 0, 1, 2, 3, or 4; x has a value of 0, 1 or 2; wherein in the resin m has a value of 0 to 0.90; n has a value of 0.05 to 0.99; o has a value of 0 to 0.95; p has a value of 0.01 to 0.5; q has a value of 0 to 0.5; and m+n+o+p+q≈1.

    摘要翻译: 由倍半硅氧烷树脂制备的抗反射涂层包括单元(Ph(CH 2)r SiO(3-x)/ 2(OR x)x)m(HSiO(3-x)/ 2(OR x)x)n(MeSiO 其中Ph是苯基,其中R 1是苯基,并且其中R 1是苯基,其中R 1是(CH 2)x(CH 2) Me是甲基; R&素; 是氢原子或具有1至4个碳原子的烃基; R选自羧酸基团或羧酸形成基团,条件是存在足够量的羧酸基团以在固化后使树脂湿法蚀刻; 并且R1选自取代的苯基,酯基,聚醚基团; 巯基,含硫有机官能团,羟基产生基团,芳基磺酸酯基团和反应性或可固化的有机官能团; r的值为0,1,2,3或4; x的值为0,1或2; 其中树脂中m的值为0至0.90; n的值为0.05至0.99; o的值为0到0.95; p的值为0.01至0.5; q的值为0到0.5; 和m + n + o + p + q≈ 1。

    UV-CURABLE SILICONE COMPOSITIONS AND ANTI-DUST COATING COMPOSITIONS CONTAINING SAME
    5.
    发明公开
    UV-CURABLE SILICONE COMPOSITIONS AND ANTI-DUST COATING COMPOSITIONS CONTAINING SAME 有权
    UV-HÄRTBARESILICONZUSAMMENSETZUNGEN UNDSTAUBBESTÄNDIGEBESCHICHTUNGSZUSAMMENSETZUNGEN DAMIT

    公开(公告)号:EP3087151A1

    公开(公告)日:2016-11-02

    申请号:EP14827670.2

    申请日:2014-12-22

    IPC分类号: C09D183/06 C08G77/14

    摘要: Provided in various embodiments are methods for making ultraviolet radiation curable (UV-curable) silicone compositions and the UV-curable silicone compositions prepared by such methods. Provided in various embodiments are methods for making anti-dust coatings using such UV-curable silicone compositions and the anti-dust coatings using such UV-curable silicone compositions prepared by such methods. The UV-curable silicone compositions may be used in the coating of silicone-based articles for LED packages, encapsulants, lamps, luminaires, optical articles and the like, substantially reducing and/or eliminating the pick-up of dust and improving optical properties of the silicone-based articles.

    摘要翻译: 在各种实施方案中提供了制备紫外线辐射固化(UV可固化)硅氧烷组合物和通过这些方法制备的可UV固化的有机硅组合物的方法。 在各种实施方案中提供了使用这种可UV固化的硅氧烷组合物制备防尘涂层的方法,以及使用通过这些方法制备的这种可UV固化的硅氧烷组合物的防尘涂层。 可UV固化的硅氧烷组合物可用于用于LED封装,密封剂,灯,照明器,光学制品等的硅氧烷基制品的涂层中,基本上减少和/或消除灰尘的拾取并改善光学性能 硅胶制品。