发明公开
EP1830984A2 CHEMICAL MECHANICAL POLISHING PAD DRESSER 审中-公开
抛光垫上,化学机械抛光

  • 专利标题: CHEMICAL MECHANICAL POLISHING PAD DRESSER
  • 专利标题(中): 抛光垫上,化学机械抛光
  • 申请号: EP05855560.8
    申请日: 2005-12-23
  • 公开(公告)号: EP1830984A2
    公开(公告)日: 2007-09-12
  • 发明人: Sung, Chien-Min
  • 申请人: Sung, Chien-Min
  • 申请人地址: No. 4, Lane 32, Chung-Cheng Road Tansui, Taipei County 23911 TW
  • 专利权人: Sung, Chien-Min
  • 当前专利权人: Sung, Chien-Min
  • 当前专利权人地址: No. 4, Lane 32, Chung-Cheng Road Tansui, Taipei County 23911 TW
  • 代理机构: Wombwell, Francis
  • 优先权: US26544 20041230
  • 国际公布: WO2006073924 20060713
  • 主分类号: B24B1/00
  • IPC分类号: B24B1/00
CHEMICAL MECHANICAL POLISHING PAD DRESSER
摘要:
CMP pad dressers and their methods of manufacture are disclosed. One aspect of the present invention provides a CMP pad dresser (20) having improved superabrasive grit retention in a resin layer. The CMP pad includes a resin layer (14), superabrasive grit (12) held in the resin layer (14) such that an exposed portion (26) of each superabrasive grit (12) protrudes from the resin layer (14), and a metal coating layer (16) disposed between each superabrasive grit (12) and the resin layer (14), where the exposed portions (26) are substantially free of the metal coating layer (16). The metal coating layer (16) acts to increase the retention of the superabrasive grit (12) in the resin layer (14) as compared to superabrasive grit (12) absent the metal coating layer (16).
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