SUPERHARD CUTTERS AND ASSOCIATED METHODS
    2.
    发明公开
    SUPERHARD CUTTERS AND ASSOCIATED METHODS 审中-公开
    超硬切割装置及相关方法

    公开(公告)号:EP1879719A2

    公开(公告)日:2008-01-23

    申请号:EP06759862.3

    申请日:2006-05-12

    申请人: Sung, Chien-Min

    发明人: Sung, Chien-Min

    IPC分类号: B24B7/22

    CPC分类号: B24B7/228 B24D7/06

    摘要: A cutting device (10) comprises a base (12) having a working side (14) that is oriented to face a workpiece (19) from which material is to be removed. A plurality of individual cutting elements (16) are arranged on the working side of the base, with each cutting element having a peak that comprises at least one cutting edge (18) that is formed from a polycrystalline superhard material. The peaks of the cutting elements are aligned in a common plane (20).

    METHODS OF MAXIMIZING RETENTION OF SUPERABRASIVE PARTICLES IN A METAL MATRIX
    3.
    发明公开
    METHODS OF MAXIMIZING RETENTION OF SUPERABRASIVE PARTICLES IN A METAL MATRIX 审中-公开
    VERFAHREN ZUR MAXIMIERUNG DER保留在EINER METALLMATRIX VON SUPERSCHLEIFPARTIKARN

    公开(公告)号:EP1819483A2

    公开(公告)日:2007-08-22

    申请号:EP05853369.6

    申请日:2005-12-07

    申请人: Sung, Chien-Min

    发明人: Sung, Chien-Min

    IPC分类号: B24D18/00

    摘要: Methods of maximizing retention of superabrasive particles in a metal matrix are disclosed. The superabrasive particles (10) may be chemically bonded with the metal matrix (15) to a degree which holds the superabrasive particles (10) in the metal matrix (15) without substantially degrading the superabrasive particles (10). Substantially degrading the superabrasive particles (10) can be avoided by protecting the superabrasive particles (10) from over-bonding during the chemical bonding process.

    摘要翻译: 公开了使超研磨颗粒在金属基体中的保留最大化的方法。 超研磨颗粒可以与金属基质化学键合到一定程度,其将超研磨颗粒保持在金属基体中,而不会使超研磨颗粒基本上降解。 通过在化学粘合过程中保护超级磨料颗粒免受过度粘结,可以避免基本上降解超磨料颗粒。

    CHEMICAL MECHANICAL POLISHING PAD DRESSER
    6.
    发明公开
    CHEMICAL MECHANICAL POLISHING PAD DRESSER 审中-公开
    抛光垫上,化学机械抛光

    公开(公告)号:EP1830984A2

    公开(公告)日:2007-09-12

    申请号:EP05855560.8

    申请日:2005-12-23

    申请人: Sung, Chien-Min

    发明人: Sung, Chien-Min

    IPC分类号: B24B1/00

    摘要: CMP pad dressers and their methods of manufacture are disclosed. One aspect of the present invention provides a CMP pad dresser (20) having improved superabrasive grit retention in a resin layer. The CMP pad includes a resin layer (14), superabrasive grit (12) held in the resin layer (14) such that an exposed portion (26) of each superabrasive grit (12) protrudes from the resin layer (14), and a metal coating layer (16) disposed between each superabrasive grit (12) and the resin layer (14), where the exposed portions (26) are substantially free of the metal coating layer (16). The metal coating layer (16) acts to increase the retention of the superabrasive grit (12) in the resin layer (14) as compared to superabrasive grit (12) absent the metal coating layer (16).