发明授权
EP1835312B1 Illumination device for a microlithographic projection apparatus having an element made of uniaxial crystal and having a plurality of refractive or diffractive structures extending along an axis being parallel or perpendicular to the crystal axis
有权
对于具有几个平行制成的单轴晶体或布置成垂直于折射或衍射结构的晶轴的光学元件的微光刻投射曝光设备的照明装置
- 专利标题： Illumination device for a microlithographic projection apparatus having an element made of uniaxial crystal and having a plurality of refractive or diffractive structures extending along an axis being parallel or perpendicular to the crystal axis
- 专利标题（中）： 对于具有几个平行制成的单轴晶体或布置成垂直于折射或衍射结构的晶轴的光学元件的微光刻投射曝光设备的照明装置
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申请号： EP07103867.3申请日： 2007-03-09
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公开(公告)号： EP1835312B1公开(公告)日： 2011-05-04
- 发明人: Schuster, Karl-Heinz , Hartmaier, Jürgen , Maul, Manfred , Schmerek, Dieter , Müller, Detlev , Hahnemann, Otto , Marianek, Frank , Weiss, Gundula , Fiolka, Damian
- 申请人： Carl Zeiss SMT GmbH
- 申请人地址： Rudolf-Eber-Strasse 2 73447 Oberkochen DE
- 专利权人： Carl Zeiss SMT GmbH
- 当前专利权人： Carl Zeiss SMT GmbH
- 当前专利权人地址： Rudolf-Eber-Strasse 2 73447 Oberkochen DE
- 代理机构： Frank, Hartmut
- 优先权： DE102006012034 20060314; US782089P 20060314
- 主分类号： G02B1/08
- IPC分类号： G02B1/08 ; G02B3/00 ; G02B27/00 ; G03B27/72
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