专利检索 ap:("Carl Zeiss SMT GmbH") AND inv:"Müller, Detlev" 第 1 页

$Illumination device for a microlithographic projection apparatus having an element made of uniaxial crystal and having a plurality of refractive or diffractive structures extending along an axis being parallel or perpendicular to the crystal axis$

1.

发明授权
Illumination device for a microlithographic projection apparatus having an element made of uniaxial crystal and having a plurality of refractive or diffractive structures extending along an axis being parallel or perpendicular to the crystal axis 有权
标题翻译：对于具有几个平行制成的单轴晶体或布置成垂直于折射或衍射结构的晶轴的光学元件的微光刻投射曝光设备的照明装置

公开(公告)号：EP1835312B1

公开(公告)日：2011-05-04

申请号：EP07103867.3

申请日：2007-03-09

申请人： Carl Zeiss SMT GmbH

发明人： Schuster, Karl-Heinz , Hartmaier, Jürgen , Maul, Manfred , Schmerek, Dieter , Müller, Detlev , Hahnemann, Otto , Marianek, Frank , Weiss, Gundula , Fiolka, Damian

IPC分类号： G02B1/08 , G02B3/00 , G02B27/00 , G03B27/72

CPC分类号： G03F7/70075 , G02B1/02 , G02B1/08 , G02B3/005 , G02B3/0068 , G02B5/1823 , G02B5/1833 , G02B5/1838 , G02B5/1866 , G03B27/72 , G03F7/70158 , G03F7/70566 , G03F7/70958 , G03F7/70966