发明公开
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 光刻设备和器件制造方法
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申请号： EP07251323.7申请日： 2007-03-28
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公开(公告)号： EP1843206A2公开(公告)日： 2007-10-10
- 发明人: Wijckmans, Maurice , Cuijpers, Martinus Agnes Willem , de Jong, Frederik Eduard , van Gompel, Edwin Augustinus Matheus , Jansen, Rob , Kusters, Gerardus Adrianus Antonius Maria , Cadee, Theodorus, Petrus Maria , Smeets, Martin Frans Pierre , van der Meulen, Frits , Simons, Wilhelmus Franciscus Johannes , Leenders, Martinus Hendrikus Antonius , Ottens, Joost Jeroen , van Baren, Martijn
- 申请人： ASML Netherlands B.V.
- 申请人地址： De Run 6501 5504 DR Veldhoven NL
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： De Run 6501 5504 DR Veldhoven NL
- 代理机构： Leeming, John Gerard
- 优先权： US789604P 20060406
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table (WT) configured to hold a substrate (W), the substrate table comprising a conditioning system (100) configured to hold a conditioning fluid and to condition the substrate table, wherein the conditioning system comprises a pressure damper (104,105) in fluid communication with the conditioning system and arranged to dampen a pressure variation in the conditioning system.
公开/授权文献
- EP1843206B1 Lithographic apparatus and device manufacturing method 公开/授权日：2012-09-05
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