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公开(公告)号：EP1843206B1
公开(公告)日：2012-09-05
申请号：EP07251323.7
申请日：2007-03-28
发明人： Wijckmans, Maurice , Cuijpers, Martinus Agnes Willem , de Jong, Frederik Eduard , van Gompel, Edwin Augustinus Matheus , Jansen, Rob , Kusters, Gerardus Adrianus Antonius Maria , Cadee, Theodorus, Petrus Maria , Smeets, Martin Frans Pierre , van der Meulen, Frits , Simons, Wilhelmus Franciscus Johannes , Leenders, Martinus Hendrikus Antonius , Ottens, Joost Jeroen , van Baren, Martijn
CPC分类号： G03F7/70875 , F16L55/053 , G03F7/70341 , G03F7/70783
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公开(公告)号：EP1843206A2
公开(公告)日：2007-10-10
申请号：EP07251323.7
申请日：2007-03-28
发明人： Wijckmans, Maurice , Cuijpers, Martinus Agnes Willem , de Jong, Frederik Eduard , van Gompel, Edwin Augustinus Matheus , Jansen, Rob , Kusters, Gerardus Adrianus Antonius Maria , Cadee, Theodorus, Petrus Maria , Smeets, Martin Frans Pierre , van der Meulen, Frits , Simons, Wilhelmus Franciscus Johannes , Leenders, Martinus Hendrikus Antonius , Ottens, Joost Jeroen , van Baren, Martijn
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , F16L55/053 , G03F7/70341 , G03F7/70783
摘要： A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table (WT) configured to hold a substrate (W), the substrate table comprising a conditioning system (100) configured to hold a conditioning fluid and to condition the substrate table, wherein the conditioning system comprises a pressure damper (104,105) in fluid communication with the conditioning system and arranged to dampen a pressure variation in the conditioning system.
摘要翻译： 本发明公开了一种光刻设备，其被布置为将图案形成装置的图案投影到衬底上，光刻设备具有被配置为保持衬底（W）的衬底台（WT），该衬底台包括配置的调节系统（100） 以保持调节流体并调节衬底台，其中调节系统包括与调节系统流体连通的压力阻尼器（104,105），并且布置成抑制调节系统中的压力变化。
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公开(公告)号：EP1628161A2
公开(公告)日：2006-02-22
申请号：EP05254783.3
申请日：2005-07-29
发明人： Cadee, Theodorus Petrus Maria , Jacobs, Johannes Henricus Wilhelmus , Ten Kate, Nicolaas , Loopstra, Erik Roelof , Van Meer, Aschwin Lodewijk Hendricus Johannes , Mertens, Jeroen Johannes Sophia Maria , De Mol, Christianus Gerardus Maria , Muitjens, Marcel Johannus Elisabeth Hubertus , Van der Net, Antonius Johannus , Ottens, Joost Jeroen , Quaedackers, Johannes Anna , Reuhman-Huisken, Maria Elisabeth , Stavenga, Marco Koert , Tinnemans, Patricius Aloysius Jacobus , Verhagen, Martinus Cornelis Maria , Verspaij, Jacobus Johannus Leonardus Hendricus , De Jong, Frederik Eduard , Goorman, Koen , Menchtchikov, Boris , Boom, Herman , Nihtianov, Stoyan , Moerman, Richard , Smeets, Martin Frans Pierre , Schoondermark, Bart Leonard Peter , Janssen, Franciscus Johannes Joseph , RIepen, Michel
IPC分类号： G03F7/20
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.
摘要翻译： 1。一种光刻设备，包括：照射系统（IL），配置成调节辐射束（PB）; 被构造成支撑图案形成装置（MA）的支撑件（MT），所述图案形成装置能够在辐射束的横截面上赋予图案以形成图案化的辐射束; 衬底台（WT），构造成保持衬底（W）; 投影系统（PL），其经配置以将所述经图案化的辐射束投影到所述衬底的目标部分上; 液体供应系统（130），所述液体供应系统（130）被配置为用液体至少部分地填充所述投影系统的最终元件和所述衬底之间的空间（25）; 密封元件（12），基本上将所述液体容纳在所述投影系统的所述最终元件和所述衬底之间的所述空间内; 和元件（30,50,60,120,140）以控制和/或补偿来自所述衬底的浸没液体的蒸发。
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公开(公告)号：EP1628161B1
公开(公告)日：2012-11-28
申请号：EP05254783.3
申请日：2005-07-29
发明人： Cadee, Theodorus Petrus Maria , Jacobs, Johannes Henricus Wilhelmus , Ten Kate, Nicolaas , Loopstra, Erik Roelof , Van Meer, Aschwin Lodewijk Hendricus Johannes , Mertens, Jeroen Johannes Sophia Maria , De Mol, Christianus Gerardus Maria , Muitjens, Marcel Johannus Elisabeth Hubertus , Van der Net, Antonius Johannus , Ottens, Joost Jeroen , Quaedackers, Johannes Anna , Reuhman-Huisken, Maria Elisabeth , Stavenga, Marco Koert , Tinnemans, Patricius Aloysius Jacobus , Verhagen, Martinus Cornelis Maria , Verspaij, Jacobus Johannus Leonardus Hendricus , De Jong, Frederik Eduard , Goorman, Koen , Menchtchikov, Boris , Boom, Herman , Nihtianov, Stoyan , Moerman, Richard , Smeets, Martin Frans Pierre , Schoondermark, Bart Leonard Peter , Janssen, Franciscus Johannes Joseph , Riepen, Michel
IPC分类号： G03F7/20
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
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公开(公告)号：EP1843206A3
公开(公告)日：2008-11-26
申请号：EP07251323.7
申请日：2007-03-28
发明人： Wijckmans, Maurice , Cuijpers, Martinus Agnes Willem , de Jong, Frederik Eduard , van Gompel, Edwin Augustinus Matheus , Jansen, Rob , Kusters, Gerardus Adrianus Antonius Maria , Cadee, Theodorus, Petrus Maria , Smeets, Martin Frans Pierre , van der Meulen, Frits , Simons, Wilhelmus Franciscus Johannes , Leenders, Martinus Hendrikus Antonius , Ottens, Joost Jeroen , van Baren, Martijn
CPC分类号： G03F7/70875 , F16L55/053 , G03F7/70341 , G03F7/70783
摘要： A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table (WT) configured to hold a substrate (W), the substrate table comprising a conditioning system (100) configured to hold a conditioning fluid and to condition the substrate table, wherein the conditioning system comprises a pressure damper (104,105) in fluid communication with the conditioning system and arranged to dampen a pressure variation in the conditioning system.
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公开(公告)号：EP1628161A3
公开(公告)日：2006-06-07
申请号：EP05254783.3
申请日：2005-07-29
发明人： Cadee, Theodorus Petrus Maria , Jacobs, Johannes Henricus Wilhelmus , Ten Kate, Nicolaas , Loopstra, Erik Roelof , Van Meer, Aschwin Lodewijk Hendricus Johannes , Mertens, Jeroen Johannes Sophia Maria , De Mol, Christianus Gerardus Maria , Muitjens, Marcel Johannus Elisabeth Hubertus , Van der Net, Antonius Johannus , Ottens, Joost Jeroen , Quaedackers, Johannes Anna , Reuhman-Huisken, Maria Elisabeth , Stavenga, Marco Koert , Tinnemans, Patricius Aloysius Jacobus , Verhagen, Martinus Cornelis Maria , Verspaij, Jacobus Johannus Leonardus Hendricus , De Jong, Frederik Eduard , Goorman, Koen , Menchtchikov, Boris , Boom, Herman , Nihtianov, Stoyan , Moerman, Richard , Smeets, Martin Frans Pierre , Schoondermark, Bart Leonard Peter , Janssen, Franciscus Johannes Joseph , RIepen, Michel
IPC分类号： G03F7/20
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.
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