发明授权
- 专利标题: GASEINLASSORGAN F]R EINEN CVD-REAKTOR
- 专利标题(英): Gas inlet element for a cvd reactor
- 专利标题(中): 气体入口器官F] R A CVD反应器
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申请号: EP06724824.5申请日: 2006-01-05
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公开(公告)号: EP1861520B1公开(公告)日: 2009-08-12
- 发明人: REINHOLD, Markus , BAUMANN, Peter
- 申请人: AIXTRON AG
- 申请人地址: Kaiserstrasse 98 52134 Herzogenrath DE
- 专利权人: AIXTRON AG
- 当前专利权人: AIXTRON AG
- 当前专利权人地址: Kaiserstrasse 98 52134 Herzogenrath DE
- 代理机构: Grundmann, Dirk
- 优先权: DE102005003984 20050128
- 国际公布: WO2006079576 20060803
- 主分类号: C23C16/455
- IPC分类号: C23C16/455
摘要:
The invention relates to a gas inlet element (2) for a CVD reactor with a chamber (4), which has a multitude of bottom-side outlet openings (23), via which a process gas introduced into the chamber (4) via edge-side access openings (10) exits into a process chamber (21) of the CVD reactor (1). In order to homogenize the gas composition, the invention provides that at least one mixing chamber arrangement (11, 12, 13) is situated upstream from the access openings (10), and at least two process gases are mixed with one another inside this mixing chamber arrangement.
公开/授权文献
- EP1861520A2 GASEINLASSORGAN F]R EINEN CVD-REAKTOR 公开/授权日:2007-12-05
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