发明公开
EP1894967A1 FILLER FOR SUBSTRATE AND COMPOSITION FOR USE AS MATERIAL FOR INORGANIC/ORGANIC COMPOSITE SUBSTRATE FORMATION
审中-公开
填料物,以用作材料上以形成有机无机复合基材接触及组成
- 专利标题: FILLER FOR SUBSTRATE AND COMPOSITION FOR USE AS MATERIAL FOR INORGANIC/ORGANIC COMPOSITE SUBSTRATE FORMATION
- 专利标题(中): 填料物,以用作材料上以形成有机无机复合基材接触及组成
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申请号: EP06767059.6申请日: 2006-06-21
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公开(公告)号: EP1894967A1公开(公告)日: 2008-03-05
- 发明人: TSUKAMOTO, Nami c/o NISSHINBO INDUSTRIES, INC. , HASHIBA, Toshifumi c/o NISSHINBO INDUSTRIES, INC. , MIZUSHIRI, Mayumi c/o NISSHINBO INDUSTRIES, INC.
- 申请人: Nisshinbo Industries, Inc.
- 申请人地址: 31-11, Nihonbashi Ningyocho 2-chome Chuo-ku, Tokyo 103-8650 JP
- 专利权人: Nisshinbo Industries, Inc.
- 当前专利权人: Nisshinbo Industries, Inc.
- 当前专利权人地址: 31-11, Nihonbashi Ningyocho 2-chome Chuo-ku, Tokyo 103-8650 JP
- 代理机构: Stuart, Ian Alexander
- 优先权: JP2005181018 20050621
- 国际公布: WO2006137432 20061228
- 主分类号: C08K9/04
- IPC分类号: C08K9/04 ; C08L101/00 ; H05K1/03
摘要:
A filler for substrates which comprises an inorganic substance and a carbodiimide-group-containing organic layer chemically bonded to the surface of the inorganic substance. Examples of the carbodiimide-group-containing organic layer include a layer comprising a carbodiimide-group-containing compound represented by either of the following formulae. Due to the constitution, the filler for substrates can be highly dispersed in a resin for substrates even when added in a high proportion and can give a substrate inhibited from deteriorating in electrical properties, mechanical properties, etc. X 1 m - Z - A - R 1 - N = C = N n - R 1 - NCO 1 X 1 m - Z - A - R 1 - N = C = N n - R 1 - A - Z - X 2 3 1
[R 1 represents a residue of an isocyanate compound; X 1 and X 2 each independently represents hydrogen, halogeno, etc.; Z's each independently represents silicon or titanium; A represents an organic group having a valence of 2 or higher containing a bond derived from an isocyanate group; m and 1 each is an integer of 1-3, provided that m+1=4; and n is an integer of 1-100.]
[R 1 represents a residue of an isocyanate compound; X 1 and X 2 each independently represents hydrogen, halogeno, etc.; Z's each independently represents silicon or titanium; A represents an organic group having a valence of 2 or higher containing a bond derived from an isocyanate group; m and 1 each is an integer of 1-3, provided that m+1=4; and n is an integer of 1-100.]
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