发明授权
- 专利标题： DEVELOPER SOLUTION AND PROCESS FOR USE
- 专利标题（中）： 显影液和使用过程中
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申请号： EP06790025.8申请日： 2006-08-28
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公开(公告)号： EP1958028B1公开(公告)日： 2011-04-27
- 发明人: FENG, Kesheng , HART, Daniel, J.
- 申请人： MacDermid, Incorporated
- 申请人地址： 245 Freight Street Waterbury, CT 06702 US
- 专利权人： MacDermid, Incorporated
- 当前专利权人： MacDermid, Incorporated
- 当前专利权人地址： 245 Freight Street Waterbury, CT 06702 US
- 代理机构： Jenkins, Peter David
- 优先权： US290118 20051130
- 国际公布： WO2007064377 20070607
- 主分类号： G03F7/30
- IPC分类号： G03F7/30
摘要：
An improved composition and method for the development of resists is disclosed. The method comprises contacting the resist with a developer solution comprising a source of alkalinity and a cationic surfactant which is an ethoxylated and/or propoxylated tallow amine. The improved developer solution more effectively removes the uncured resist from the resist coated surface.
公开/授权文献
- EP1958028A1 DEVELOPER SOLUTION AND PROCESS FOR USE 公开/授权日：2008-08-20
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