发明公开
- 专利标题： PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- 专利标题（中）： 微光刻投影曝光装置的投影镜头
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申请号： EP06830432.8申请日： 2006-12-07
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公开(公告)号： EP1963921A1公开(公告)日： 2008-09-03
- 发明人: BEDER, Susanne , KRÄHMER, Daniel , FELDMANN, Heiko
- 申请人： Carl Zeiss SMT AG
- 申请人地址： Rudolf-Eber-Strasse 2 73447 Oberkochen DE
- 专利权人： Carl Zeiss SMT AG
- 当前专利权人： Carl Zeiss SMT AG
- 当前专利权人地址： Rudolf-Eber-Strasse 2 73447 Oberkochen DE
- 代理机构： Frank, Hartmut
- 优先权： US753715P 20051223; DE102006038454 20060816
- 国际公布： WO2007071565 20070628
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A projection objective (100) of a microlithographic projection exposure apparatus, serving to project an image of a mask that can be set in position in an object plane (OP) onto a light-sensitive coating layer that can be set in position in an image plane (IP), wherein the projection objective is designed to operate in an immersion mode, produces at least one intermediate image (IMI) and comprises an optical subsystem (130) on the image-plane side which projects said intermediate image (IMI) into the image plane with an image-plane-side projection ratio βi, wherein said image-plane-side projection ration βi,has an absolute value of at least 0.3.
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