公开(公告)号：EP1771771B1

公开(公告)日：2009-12-30

申请号：EP05785351.7

申请日：2005-07-08

申请人： Carl Zeiss SMT AG

发明人： SHAFER, David ,  ULRICH, Wilhelm ,  DODOC, Aurelian ,  VON BÜNAU, Rudolf ,  MANN, Hans-Jürgen ,  EPPLE, Alexander ,  BEDER, Susanne ,  SINGER, Wolfgang

IPC分类号： G03F7/00 ,  G02B17/00 ,  G02B17/08

CPC分类号： G02B17/0892 ,  G02B17/0828 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341

公开(公告)号：EP1714192A1

公开(公告)日：2006-10-25

申请号：EP04804317.8

申请日：2004-12-27

申请人： Carl Zeiss SMT AG

发明人： KNEER, Bernhard ,  WABRA, Norbert ,  GRUNER, Toralf ,  EPPLE, Alexander ,  BEDER, Susanne ,  SINGER, Wolfgang

IPC分类号： G03F7/20

CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： A projection objective of a microlithographic projection exposure apparatus (110) is designed for immersion operation in which an immersion liquid (134) adjoins a photosensitive layer (126). The refractive index of the immersion liquid is greater than the refractive index of a medium (L5; 142; L205; LL7; LL8; LL9). that adjoins the immersion liquid on the object side of the projection objective (120; 120'; 120'). The projection objective is designed such that the immersion liquid (134) is convexly curved towards the object plane (122) during immersion operation.

摘要翻译： 微光刻投射曝光设备（110）的投影物镜被设计用于浸没操作，其中浸没液体（134）邻接光敏层（126）。 浸液的折射率大于介质（L5; 142; L205; LL7; LL8; LL9）的折射率。 ，其邻接投射物镜（120; 120'; 120'）的物体侧上的浸没液体。 投影物镜被设计为使得浸入液体（134）在浸入操作期间朝物面（122）凸出地弯曲。

公开(公告)号：EP1924890A1

公开(公告)日：2008-05-28

申请号：EP06793489.3

申请日：2006-09-13

申请人： Carl Zeiss SMT AG

发明人： TOTZECK, Michael ,  BEDER, Susanne ,  CLAUSS, Wilfried ,  FELDMANN, Heiko ,  KRÄHMER, Daniel ,  DODOC, Aurelian

IPC分类号： G03F7/20

CPC分类号： G02B5/3083 ,  G02B27/286 ,  G03F7/70566 ,  G03F7/70966

摘要： An optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, according to one aspect of the present invention has an optical system axis (OA) and at least one element group (200) consisting of three birefringent elements (211 ,212,213) each of which being made of optically uniaxial material and having an aspheric surface, wherein a first birefringent element (211 ) of said group has a first orientation of its optical crystal axis, a second birefringent element (212) of said group has a second orientation of its optical crystal axis, wherein said second orientation can be described as emerging from a rotation of said first orientation, said rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element (213) of said group has a third orientation of its optical crystal axis, wherein said third orientation can be described as emerging from a rotation of said second orientation said rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.

公开(公告)号：EP1842027A2

公开(公告)日：2007-10-10

申请号：EP06703920.6

申请日：2006-01-20

申请人： Carl Zeiss SMT AG

发明人： HETZLER, Jochen ,  BEDER, Susanne ,  FELDMANN, Heiko

IPC分类号： G01B9/021 ,  G01B11/24

CPC分类号： G01B9/021 ,  G01B9/02039 ,  G01B11/2441

摘要： A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer Ia directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.

公开(公告)号：EP1771771A1

公开(公告)日：2007-04-11

申请号：EP05785351.7

申请日：2005-07-08

申请人： Carl Zeiss SMT AG

发明人： SHAFER, David ,  ULRICH, Wilhelm ,  DODOC, Aurelian ,  VON BÜNAU, Rudolf ,  MANN, Hans-Jürgen ,  EPPLE, Alexander ,  BEDER, Susanne ,  SINGER, Wolfgang

IPC分类号： G03F7/00 ,  G02B17/00 ,  G02B17/08

CPC分类号： G02B17/0892 ,  G02B17/0828 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341

摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax , a maximum image field height Y', and an image side numerical aperture NA; wherein COMP1 = Dmax / (Y' • NA2) and wherein the condition COMP1

公开(公告)号：EP1700163A1

公开(公告)日：2006-09-13

申请号：EP04803844.2

申请日：2004-12-14

申请人： Carl Zeiss SMT AG ,  Singer, Dr., Wolfgang

发明人： SHAFER, David ,  BEDER, Susanne ,  SCHUSTER, Karl-Heinz ,  SINGER, Wolfgang, Dr.

IPC分类号： G03F7/20

CPC分类号： G02B3/12 ,  G02B17/0812 ,  G02B17/0856 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index NF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.

公开(公告)号：EP1697798A2

公开(公告)日：2006-09-06

申请号：EP04803712.1

申请日：2004-12-10

申请人： Carl Zeiss SMT AG

发明人： BEDER, Susanne ,  SINGER, Wolfgang

IPC分类号： G03F7/20

CPC分类号： G02B17/0892 ,  G02B17/0828 ,  G03F7/70225 ,  G03F7/70341 ,  G03F7/7035 ,  G03F7/70958 ,  G03F7/70966

摘要： A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n ≥ 1.6 at the operating wavelength.

公开(公告)号：EP2030070A1

公开(公告)日：2009-03-04

申请号：EP07764671.9

申请日：2007-06-15

申请人： Carl Zeiss SMT AG

发明人： SCHUSTER, Karl-Heinz ,  FELDMANN, Heiko ,  GRUNER, Toralf ,  TOTZECK, Michael ,  CLAUSS, Wilfried ,  BEDER, Susanne ,  KRÄHMER, Daniel ,  DITTMANN, Olaf

IPC分类号： G02B27/00 ,  G03F7/20 ,  G02B5/30

CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element (L3) with an index of refraction greater than 1.6. This element (L3) has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume (L3') which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

公开(公告)号：EP1963921A1

公开(公告)日：2008-09-03

申请号：EP06830432.8

申请日：2006-12-07

申请人： Carl Zeiss SMT AG

发明人： BEDER, Susanne ,  KRÄHMER, Daniel ,  FELDMANN, Heiko

IPC分类号： G03F7/20

CPC分类号： G02B13/14 ,  G02B13/143 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70966

摘要： A projection objective (100) of a microlithographic projection exposure apparatus, serving to project an image of a mask that can be set in position in an object plane (OP) onto a light-sensitive coating layer that can be set in position in an image plane (IP), wherein the projection objective is designed to operate in an immersion mode, produces at least one intermediate image (IMI) and comprises an optical subsystem (130) on the image-plane side which projects said intermediate image (IMI) into the image plane with an image-plane-side projection ratio βi, wherein said image-plane-side projection ration βi,has an absolute value of at least 0.3.

公开(公告)号：EP1891481A1

公开(公告)日：2008-02-27

申请号：EP06761945.2

申请日：2006-05-26

申请人： Carl Zeiss SMT AG

发明人： BEDER, Susanne ,  SINGER, Wolfgang ,  SCHUSTER, Karl-Heinz

IPC分类号： G03F7/20

CPC分类号： G02B17/0892 ,  B82Y10/00 ,  G02B17/0804 ,  G02B17/0812 ,  G03F7/70225 ,  G03F7/70325 ,  G03F7/70341 ,  G03F7/70958

摘要： A projection objective for imaging a pattern provided in an object plane (OP) of the projection objective onto an image plane (IP) of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element (LOEl, L0E2) is a high-index optical element made from a high-index material with a refractive index n >= 1.6 at the operating wavelength.