发明公开
EP1975704A3 Mold structure, imprinting method using the same, magnetic recording medium and production method thereof
审中-公开
模具结构，使用其的压印方法，磁记录介质及其制造方法
- 专利标题： Mold structure, imprinting method using the same, magnetic recording medium and production method thereof
- 专利标题（中）： 模具结构，使用其的压印方法，磁记录介质及其制造方法
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申请号： EP08153536.1申请日： 2008-03-28
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公开(公告)号： EP1975704A3公开(公告)日： 2008-12-10
- 发明人: Kenichi, Moriwaki, c/o FUJIFILM Corporation , Toshihiro, Usa, c/o FUJIFILM Corporation , Masakazu, Nishikawa, c/o FUJIFILM Corporation
- 申请人： Fujifilm Corporation
- 申请人地址： 2-26-30 Nishiazabu, Minato-ku Tokyo 106-8620 JP
- 专利权人： Fujifilm Corporation
- 当前专利权人： Fujifilm Corporation
- 当前专利权人地址： 2-26-30 Nishiazabu, Minato-ku Tokyo 106-8620 JP
- 代理机构： Thun, Clemens
- 优先权： JP2007094829 20070330; JP2008002276 20080109
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G11B5/855 ; B29C33/42 ; B29C45/26 ; H01L21/027
摘要：
The present invention provides a mold structure including: a concavo-convex pattern formed on its surface, wherein the mold structure is used for transferring the concavo-convex pattern onto an imprint resist layer formed on a surface of a substrate having a thickness of 0.3mm to 2.0mm by placing the concavo-convex pattern against the imprint resist layer, and wherein a thickness Dm (mm) of the mold structure, a thickness Ds (mm) of the substrate and a curl amount C (mm) of the mold structure satisfy the relationship 0.01≤10,000×(Dm 3 /Ds 3 ) 1/2 ×C 2 ≤250.
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