发明公开
EP1998222A2 Coating compositions 有权
涂料组合物

Coating compositions
摘要:
The invention relates to organic coating compositions useful for photolithographic processes including the manufacture of semiconductors and other electronic devices. Compositions of the invention comprise component that comprise a nitrile-containing component, such as a resin component that contains nitrile moieties. Compositions of the invention are particularly useful as an underlayer material in two, three, four or more layer pattern forming processes.
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