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公开(公告)号：EP1998222A2
公开(公告)日：2008-12-03
申请号：EP08154133.6
申请日：2008-04-07
IPC分类号： G03F7/09
CPC分类号： G03F7/091
摘要： The invention relates to organic coating compositions useful for photolithographic processes including the manufacture of semiconductors and other electronic devices. Compositions of the invention comprise component that comprise a nitrile-containing component, such as a resin component that contains nitrile moieties. Compositions of the invention are particularly useful as an underlayer material in two, three, four or more layer pattern forming processes.
摘要翻译： 本发明涉及可用于光刻工艺的有机涂料组合物，包括制造半导体和其他电子器件。 本发明的组合物包含含有含腈组分的组分，例如含有腈部分的树脂组分。 本发明的组合物作为2,3,4或更多层图案形成工艺中的底层材料特别有用。
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公开(公告)号：EP2071400A1
公开(公告)日：2009-06-17
申请号：EP08168807.9
申请日：2008-11-11
CPC分类号： G03F7/091 , G03F7/0752
摘要： In one aspect, the invention relates to silicon-containing organic coating compositions, particularly antireflective coating compositions, that contain a repeat unit wherein chromophore moieties such as phenyl are spaced from Si atom(s). In another aspect, silicon-containing underlayer compositions are provided that are formulated as a liquid (organic solvent) composition, where at least one solvent of the solvent component comprise hydroxy groups.
摘要翻译： 一方面，本发明涉及含有重复单元的含硅有机涂料组合物，特别是抗反射涂料组合物，其中发色团部分例如苯基与Si原子间隔开。 另一方面，提供配制成液体（有机溶剂）组合物的含硅底层组合物，其中溶剂组分的至少一种溶剂包含羟基。
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公开(公告)号：EP1998222A3
公开(公告)日：2009-03-04
申请号：EP08154133.6
申请日：2008-04-07
IPC分类号： G03F7/09
CPC分类号： G03F7/091
摘要： The invention relates to organic coating compositions useful for photolithographic processes including the manufacture of semiconductors and other electronic devices. Compositions of the invention comprise component that comprise a nitrile-containing component, such as a resin component that contains nitrile moieties. Compositions of the invention are particularly useful as an underlayer material in two, three, four or more layer pattern forming processes.
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