发明公开
- 专利标题: X-Ray Imaging Device and Method for the Manufacturing thereof
- 专利标题(中): 它们的制备的X射线成像装置和处理
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申请号: EP08162513.9申请日: 2008-08-18
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公开(公告)号: EP2026383A3公开(公告)日: 2009-08-05
- 发明人: Von Känel, Hans , Kaufmann, Rolf
- 申请人: CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement
- 申请人地址: Rue Jaquet-Droz 1 P.O. Box 2002 Neuchâtel CH
- 专利权人: CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement
- 当前专利权人: CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement
- 当前专利权人地址: Rue Jaquet-Droz 1 P.O. Box 2002 Neuchâtel CH
- 代理机构: Schneider Feldmann AG Patent- und Markenanwälte
- 优先权: US956391P 20070817
- 主分类号: H01L27/146
- IPC分类号: H01L27/146
摘要:
The present invention discloses an X-ray imaging device (100) comprising an X-ray absorber (105) that comprises a plurality of semiconductor layers. The plurality of semiconductor layers comprise a substrate (110) having a backside; and at least one absorption layer (120,130,140,150) adapted to absorb at least one X-ray photon impinging on the at least one absorption layer that is adapted to correspondingly generate in response to the at least one impinging X-ray photon at least one electron-hole pair; and a readout unit (310), wherein the readout unit is operatively coupled to the X-ray absorber (105) such to enable readout of the at least one electron-hole pair. Additional and alternative embodiments are described and claimed.
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