发明公开
EP2034364A1 METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN
审中-公开
一种用于形成结构和成分上以形成有机发光薄膜的使用中出现
- 专利标题： METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN
- 专利标题（中）： 一种用于形成结构和成分上以形成有机发光薄膜的使用中出现
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申请号： EP07767364.8申请日： 2007-06-21
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公开(公告)号： EP2034364A1公开(公告)日： 2009-03-11
- 发明人: SHIMIZU, Daisuke , SUGITA, Hikaru , MATSUMURA, Nobuji , KAI, Toshiyuki , SHIMOKAWA, Tsutomu
- 申请人： JSR Corporation
- 申请人地址： 6-10, Tsukiji 5-chome, Chuo-ku Tokyo 104-8410 JP
- 专利权人： JSR Corporation
- 当前专利权人： JSR Corporation
- 当前专利权人地址： 6-10, Tsukiji 5-chome, Chuo-ku Tokyo 104-8410 JP
- 代理机构： TBK-Patent
- 优先权： JP2006177034 20060627; JP2006268671 20060929
- 国际公布： WO2008001679 20080103
- 主分类号： G03F7/26
- IPC分类号： G03F7/26 ; G03F7/004
摘要：
A method for forming a pattern contains (1) a step of forming an underlayer film containing (C) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (D) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (E) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion.
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