发明公开
EP2075828A1 Semiconductor device and a method for aligining and bonding a first and second element for the fabrication of a semiconductor device
审中-公开
半导体装置和方法,用于对准和两个元件的接合用于生产半导体器件
- 专利标题: Semiconductor device and a method for aligining and bonding a first and second element for the fabrication of a semiconductor device
- 专利标题(中): 半导体装置和方法,用于对准和两个元件的接合用于生产半导体器件
-
申请号: EP08150775.8申请日: 2008-01-29
-
公开(公告)号: EP2075828A1公开(公告)日: 2009-07-01
- 发明人: Beyne, Eric , Soussan, Philippe , Ruythooren, Wouter
- 申请人: Interuniversitair Microelektronica Centrum (IMEC)
- 申请人地址: Kapeldreef 75 3001 Leuven BE
- 专利权人: Interuniversitair Microelektronica Centrum (IMEC)
- 当前专利权人: Interuniversitair Microelektronica Centrum (IMEC)
- 当前专利权人地址: Kapeldreef 75 3001 Leuven BE
- 代理机构: Hertoghe, Kris Angèle Louisa
- 优先权: US17159P 20071227
- 主分类号: H01L21/60
- IPC分类号: H01L21/60 ; H01L25/065
摘要:
The present invention relates to a method for aligning and bonding elements for the fabrication of a semiconductor device, comprising providing a first element with a protrusion, the first element having a front main surface and a back main surface, providing a second element having a front main surface and a back main surface, the second element including a front portion located at the front main surface and a back portion located at the back main surface, providing at least one metal pad, forming at least one blind hole in the second element, the hole extending from the back main surface to the metal pad thereby exposing the metal pad, aligning the protrusion of the first element with the corresponding hole of the second element; inserting the protrusion of the first element into the blind hole of the second element, bonding the protrusion to the metal pad, so that the protrusion makes electrical contact with the metal pad and the first element is bonded to the second element.
信息查询
IPC分类: