发明公开
- 专利标题: SPLIT AXES STAGE DESIGN FOR SEMICONDUCTOR APPLICATIONS
- 专利标题(中): GAP AXIS舞台设计半导体应用
-
申请号: EP08719741.4申请日: 2008-03-17
-
公开(公告)号: EP2132600A1公开(公告)日: 2009-12-16
- 发明人: VERMEULEN, Johannes Petrus Martinus Bernardus , PEIJNENBURG, Antonius T.A.
- 申请人: Koninklijke Philips Electronics N.V.
- 申请人地址: Groenewoudseweg 1 5621 BA Eindhoven NL
- 专利权人: Koninklijke Philips Electronics N.V.
- 当前专利权人: Koninklijke Philips Electronics N.V.
- 当前专利权人地址: Groenewoudseweg 1 5621 BA Eindhoven NL
- 代理机构: Kroeze, Johannes Antonius
- 优先权: US908214P 20070327
- 国际公布: WO2008117197 20081002
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; B23Q1/62 ; H01L21/687
摘要:
A stage assembly (8) includes a first stage (10) having at least one degree of freedom, i.e. at least one long stroke motion capability, and being movably mounted in a first stage base frame (12), the first stage base frame permitting motion in a first direction. A second stage (20) has at least one degree of freedom, i.e. at least one long stroke motion capability, and being movably mounted in a second stage base frame (22). The second stage base frame permitting motion in a second direction which is different from the first direction. The first stage and the second stage are located one over the other in a third direction which is orthogonal the first and second directions and a motion. An isolated reference metrology frame (18) is configured to provide a point of reference for the first and second stages in one or more degrees of freedom. Other degrees of freedom may be measured more directly from one stage relative to the other.
公开/授权文献
- EP2132600B1 SPLIT AXES STAGE DESIGN FOR SEMICONDUCTOR APPLICATIONS 公开/授权日:2012-01-04
信息查询
IPC分类: