In a known method for producing raised marking on a glass object, a suspension containing SiO2 particles is applied to a surface of the glass object as a pattern, and the pattern is compacted to form the marking. In order to enable a cost-effective production on this basis of an optically appealing and uniform marking on an object made of quartz glass, which is also suited for applications at high temperature or in a contaminant-sensitive environment - such as in solar cell and semiconductor production - it is proposed according to the invention that a binder-free suspension be used to create a marking on a quartz glass object, said suspension containing a dispersion fluid and amorphous SiO2 particles having particle sizes of up to a maximum of 500 μm, of which are between 0.2% by weight and 15% by weight SiO2 nanoparticles having particle sizes of less than 100 nm, and the solids content thereof - that is the weight proportion of the SiO2 particles and of the SiO2 nanoparticles together - is in the range between 60 and 90%.