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    VERFAHREN ZUR HERSTELLUNG EINER ERHABENEN MARKIERUNG AUF EINEM GLASGEGENSTAND
    2.
    发明公开
    VERFAHREN ZUR HERSTELLUNG EINER ERHABENEN MARKIERUNG AUF EINEM GLASGEGENSTAND 有权
    一种用于生产SUBLIME MARK ON的玻璃物品

    公开(公告)号：EP2217540A1

    公开(公告)日：2010-08-18

    申请号：EP08856787.0

    申请日：2008-11-18

    申请人： Heraeus Quarzglas GmbH & Co. KG

    发明人： WEBER, Juergen ,  TRAEGER, Norbert ,  BRAEMER, Thilo ,  WERDECKER, Waltraud ,  KARA, Maximilian

    IPC分类号： C03C17/00 ,  C03C17/04 ,  B41M7/00 ,  B41M1/34

    CPC分类号： C03C17/001 ,  B41M1/12 ,  B41M1/34 ,  B41M3/003 ,  C03C17/04 ,  C03C2218/11

    摘要： In a known method for producing raised marking on a glass object, a suspension containing SiO2 particles is applied to a surface of the glass object as a pattern, and the pattern is compacted to form the marking. In order to enable a cost-effective production on this basis of an optically appealing and uniform marking on an object made of quartz glass, which is also suited for applications at high temperature or in a contaminant-sensitive environment - such as in solar cell and semiconductor production - it is proposed according to the invention that a binder-free suspension be used to create a marking on a quartz glass object, said suspension containing a dispersion fluid and amorphous SiO2 particles having particle sizes of up to a maximum of 500 μm, of which are between 0.2% by weight and 15% by weight SiO2 nanoparticles having particle sizes of less than 100 nm, and the solids content thereof - that is the weight proportion of the SiO2 particles and of the SiO2 nanoparticles together - is in the range between 60 and 90%.

    SiO2-SCHLICKER FÜR DIE HERSTELLUNG VON QUARZGLAS SOWIE VERWENDUNG DES SCHLICKERS
    3.
    发明公开
    SiO2-SCHLICKER FÜR DIE HERSTELLUNG VON QUARZGLAS SOWIE VERWENDUNG DES SCHLICKERS 有权
    二氧化硅SCHLICKER滑差的石英玻璃的生产和使用

    公开(公告)号：EP2069244A1

    公开(公告)日：2009-06-17

    申请号：EP07820139.9

    申请日：2007-09-12

    申请人： Heraeus Quarzglas GmbH & Co. KG

    发明人： WERDECKER, Waltraud ,  TRAEGER, Norbert ,  WEBER, Juergen

    IPC分类号： C03B19/06 ,  G02B5/02 ,  C03C17/02 ,  H05B3/00

    CPC分类号： C03C17/02 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03C2218/11

    摘要： A known SiO2 slurry for the production of quartz glass contains a dispersion liquid and amorphous SiO2 particles with particle sizes to a maximum of 500µm, wherein the largest volume fraction is composed of SiO2 particles with particle sizes in the range 1µm - 60µm, as well as SiO2 nanoparticles with particle sizes less than 100nm in the range 0.2 - 15% volume by weight (of the entire solids content). In order to prepare such a slurry for use, and to optimize the flow behavior of such a slurry with regard to later processing by dressing or pouring the slurry mass, and with regard to later drying and sintering without cracks, the invention suggests a slurry with SiO2 particles with a multimodal distribution of particle sizes, with a first maximum of the sizes distribution in the range 1µm - 3µm and a second maximum in the range 5µm - 50µm, and a solids content (percentage by weight of the SiO2 particles and the SiO2 nanoparticles together) in the range 83% - 90%.