发明公开
EP2218571A1 Illumination system for use in a stereolithography apparatus 审中-公开
Beleuchtungssystem zur Verwendung在einer Stereolithographievorrichtung

Illumination system for use in a stereolithography apparatus
摘要:
An illumination system (30), comprising:
- a plurality of light-emitting diodes (LEDs) (34), each LED having at least a first, light-emitting surface (36) and a second surface (37), at least one of the first and the second surface being substantially flat;
- a plurality of electrical pathways (56), selectively connected to the respective LEDs, such that each LED can be individually controlled; and
- a levelling surface (46, 52),

wherein the levelling surface is substantially flat and in levelling contact with the at least one substantially flat surface (37, 36) of each LED, such that a two-dimensional array of LEDs extends in a plane parallel to the levelling surface.
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