Illumination system for use in a stereolithography apparatus
    1.
    发明公开
    Illumination system for use in a stereolithography apparatus 审中-公开
    Beleuchtungssystem zur Verwendung在einer Stereolithographievorrichtung

    公开(公告)号:EP2218571A1

    公开(公告)日:2010-08-18

    申请号:EP09151794.6

    申请日:2009-01-30

    IPC分类号: B29C67/00

    摘要: An illumination system (30), comprising:
    - a plurality of light-emitting diodes (LEDs) (34), each LED having at least a first, light-emitting surface (36) and a second surface (37), at least one of the first and the second surface being substantially flat;
    - a plurality of electrical pathways (56), selectively connected to the respective LEDs, such that each LED can be individually controlled; and
    - a levelling surface (46, 52),

    wherein the levelling surface is substantially flat and in levelling contact with the at least one substantially flat surface (37, 36) of each LED, such that a two-dimensional array of LEDs extends in a plane parallel to the levelling surface.

    摘要翻译: 一种照明系统(30),包括: - 多个发光二极管(LED)(34),每个LED至少具有第一发光表面(36)和第二表面(37),至少一个 所述第一和第二表面基本上是平的; - 多个电路径(56),选择性地连接到相应的LED,使得每个LED可以被单独控制; 和 - 平整表面(46,52),其中所述调平表面基本上是平坦的并且与每个LED的至少一个基本上平坦的表面(37,36)平齐地接触,使得LED的二维阵列在 平行于平整表面的平面。