发明公开
- 专利标题: PATTERN FORMATION EMPLOYING SELF-ASSEMBLED MATERIAL
- 专利标题(中): 具有自组织材料图案的形成
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申请号: EP09709244.9申请日: 2009-02-03
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公开(公告)号: EP2250123A2公开(公告)日: 2010-11-17
- 发明人: BLACK, Charles, T. , DALTON, Timothy, J. , DORIS, Bruce, B. , RADENS, Carl
- 申请人: International Business Machines Corporation
- 申请人地址: New Orchard Road Armonk, NY 10504 US
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: New Orchard Road Armonk, NY 10504 US
- 代理机构: Burt, Roger James
- 优先权: US26123 20080205
- 国际公布: WO2009100053 20090813
- 主分类号: B82B3/00
- IPC分类号: B82B3/00
摘要:
In one embodiment, hexagonal tiles encompassing a large are divided into three groups, each containing one-third of all hexagonal tiles that are disjoined among one another. Openings for the hexagonal tiles in each group (01, 02, 03) are formed in a template layer (2OA, 2OB, 20C), and a set of self-assembling block copolymers is applied and patterned within each opening. This process is repeated three times to encompass all three groups, resulting in a self-aligned pattern extending over a wide area. In another embodiment, the large area is divided into rectangular tiles of two non-overlapping and complementary groups. Each rectangular area has a width less than the range of order of self-assembling block copolymers. Self-assembled self- aligned line and space structures (4OA, 5OA; 4OB, 5OB; 4OC, 50C) are formed in each group in a sequential manner so that a line and space pattern is formed over a large area extending beyond the range of order.
公开/授权文献
- EP2250123B1 PATTERN FORMATION EMPLOYING SELF-ASSEMBLED MATERIAL 公开/授权日:2017-04-26
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