发明公开
EP2352175A1 METHOD FOR PRODUCING PHOTOELECTRIC CONVERSION DEVICE
审中-公开
VERFAHREN ZUR HERSTELLUNG EINES FOTOELEKTRISCHEN WANDLERS
- 专利标题: METHOD FOR PRODUCING PHOTOELECTRIC CONVERSION DEVICE
- 专利标题(中): VERFAHREN ZUR HERSTELLUNG EINES FOTOELEKTRISCHEN WANDLERS
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申请号: EP09828917.6申请日: 2009-08-18
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公开(公告)号: EP2352175A1公开(公告)日: 2011-08-03
- 发明人: YAMAGUCHI, Kengo , SAKAI, Satoshi , TAKEUCHI, Yoshiaki
- 申请人: Mitsubishi Heavy Industries, Ltd.
- 申请人地址: 16-5, Konan 2-chome Minato-ku Tokyo 108-8215 JP
- 专利权人: Mitsubishi Heavy Industries, Ltd.
- 当前专利权人: Mitsubishi Heavy Industries, Ltd.
- 当前专利权人地址: 16-5, Konan 2-chome Minato-ku Tokyo 108-8215 JP
- 代理机构: Bongiovanni, Simone
- 优先权: JP2008303005 20081127
- 国际公布: WO2010061667 20100603
- 主分类号: H01L31/04
- IPC分类号: H01L31/04
摘要:
Provided is a photoelectric conversion device fabrication method that realizes both high productivity and high conversion efficiency by rapidly forming an n-layer having good coverage. The fabrication method for a photoelectric conversion device (100) includes a step of forming a silicon photoelectric conversion layer (3) on a substrate (1) by a plasma CVD method. In the fabrication method for the photoelectric conversion device (100), the step of forming the photoelectric conversion layer (3) includes a step of forming an i-layer (42) formed of crystalline silicon and a step of forming, on the i-layer (42), an n-layer (43) under a condition with a hydrogen dilution ratio of 0 to 10, inclusive.
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