发明公开
- 专利标题： MATERIAL FOR MANUFACTURING TARGETS FOR PHYSICAL VAPOUR DEPOSITION OF P-TYPE TRANSPARENT CONDUCTIVE FILMS
- 专利标题（中）： 材料靶的p型用物理气相沉积透明导电膜的生产
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申请号： EP09764191.4申请日： 2009-11-30
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公开(公告)号： EP2373826A1公开(公告)日： 2011-10-12
- 发明人: HUYBERECHTS, Guido , DREES, Griet , GOEDEME, Daan , NOLAN, Michael , ELLIOTT, Simon D.
- 申请人： Umicore
- 申请人地址： Rue du Marais 31 1000 Brussels BE
- 专利权人： Umicore
- 当前专利权人： Umicore
- 当前专利权人地址： Rue du Marais 31 1000 Brussels BE
- 优先权： EP08021258 20081208; US193714P 20081218
- 国际公布： WO2010066358 20100617
- 主分类号： C23C14/34
- IPC分类号： C23C14/34 ; C01F11/02 ; C01G3/02
摘要：
The invention describes a powderous oxide material (M
x M'
y )Cu
2+a O
2+b for the production of targets for p-type transparent conductive thin films, wherein -0.2≤a≤0.2, -0.2≤b≤0.2 and either - M' is Sr and M is either one or both of Ba and bivalent Cu, with x>0, y>0 and x+y=1 ±0.2; or - M is bivalent Cu, x=1 ±0.2, and y=0.
x M'
y )Cu
2+a O
2+b for the production of targets for p-type transparent conductive thin films, wherein -0.2≤a≤0.2, -0.2≤b≤0.2 and either - M' is Sr and M is either one or both of Ba and bivalent Cu, with x>0, y>0 and x+y=1 ±0.2; or - M is bivalent Cu, x=1 ±0.2, and y=0.
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