发明公开
EP2375285A2 Photosensitive composition and pattern-forming method using the photosensitive composition
审中-公开
Zusammensetzung和Strukturierungsverfahren mit der lichtempfindlichen Zusammensetzung
- 专利标题： Photosensitive composition and pattern-forming method using the photosensitive composition
- 专利标题（中）： Zusammensetzung和Strukturierungsverfahren mit der lichtempfindlichen Zusammensetzung
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申请号： EP11171307.9申请日： 2005-02-02
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公开(公告)号： EP2375285A2公开(公告)日： 2011-10-12
- 发明人: Kodama, Kunihiko
- 申请人： FUJIFILM Corporation
- 申请人地址： 26-30 Nishiazabu 2-chome, Minato-ku, Tokyo JP
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： 26-30 Nishiazabu 2-chome, Minato-ku, Tokyo JP
- 代理机构： HOFFMANN EITLE
- 优先权： JP2004029068 20040205
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/038
摘要：
A photosensitive composition comprises (A) a sulfonium or iodonium salt having an anion represented by one of formulae (I) and (II):
wherein Y represents an alkylene group substituted with at least one fluorine atom, and
R represents an alkyl group or a cycloalkyl group.
the photosensitive composition further comprising:
(D) a resin soluble in an alkali developer; and
(E) an acid crosslinking agent that crosslinks with the resin (D).
wherein Y represents an alkylene group substituted with at least one fluorine atom, and
R represents an alkyl group or a cycloalkyl group.
the photosensitive composition further comprising:
(D) a resin soluble in an alkali developer; and
(E) an acid crosslinking agent that crosslinks with the resin (D).
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