发明授权
- 专利标题： Illumination system for illuminating a mask in a microlithographic exposure apparatus
- 专利标题（中）： 用于微光刻曝光设备的照明掩模的照明系统
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申请号： EP11006780.8申请日： 2008-12-13
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公开(公告)号： EP2388649B1公开(公告)日： 2013-06-19
- 发明人: Schubert, Erich , Kohl, Alexander , Ziegler, Gerhard-Wilhelm , Patra, Michael , Degünther, Markus , Layh, Michael
- 申请人： Carl Zeiss SMT GmbH
- 申请人地址： Rudolf-Eber-Strasse 2 73447 Oberkochen DE
- 专利权人： Carl Zeiss SMT GmbH
- 当前专利权人： Carl Zeiss SMT GmbH
- 当前专利权人地址： Rudolf-Eber-Strasse 2 73447 Oberkochen DE
- 代理机构： Schwanhäußer, Gernot
- 优先权： US16019P 20071221
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A diffractive optical element (156) is configured to be inserted into a light beam path of an illumination system (112) of a microlithographic projection exposure apparatus (10) such that it produces a desired intensity distribution in a system pupil surface (154) of the illumination system, wherein a Fourier transform of an angular distribution produced by the diffractive optical element (156) differs from the desired intensity distribution.
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