公开(公告)号：EP2388649A1

公开(公告)日：2011-11-23

申请号：EP11006780.8

申请日：2008-12-13

申请人： Carl Zeiss SMT GmbH

发明人： Schubert, Erich ,  Kohl, Alexander ,  Ziegler, Gerhard-Wilhelm ,  Patra, Michael ,  Degünther, Markus ,  Layh, Michael

IPC分类号： G03F7/20

CPC分类号： G03F7/70083 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70433

摘要： An illumination system of a microlithographic projection exposure apparatus comprises an array of mirrors or similar beam deflection elements. Each mirror of the array illuminates in a system pupil surface a single spot having a position that can be varied. A method of controlling the array comprises the steps of: determining a target intensity distribution in the system pupil surface; determining an arrangement of spots in the system pupil surface that approximates the target intensity distribution; determining a function assigned to a mirror and describing a relationship between positions of the spot illuminated by the mirror on the one hand and the deflection angle produced by the mirror when illuminating the light spots on the other hand; determining deflection angles that are necessary to obtain the arrangement of spots by using the function; and supplying control signals to the mirrors such that the deflection angles determined before are produced.

摘要翻译： 微光刻投影曝光设备的照明系统包括镜阵列或类似的光束偏转元件。 阵列的每个反射镜在系统瞳孔表面中照射具有可以改变的位置的单个斑点。 控制阵列的方法包括以下步骤：确定系统光瞳表面中的目标强度分布; 确定系统光瞳表面中接近目标强度分布的点的布置; 确定分配给反射镜的功能，并且一方面描述由反射镜照射的点的位置与另一方面在照射光点时由反射镜产生的偏转角之间的关系; 通过使用该函数确定获得点布置所需的偏转角; 并提供控制信号给反射镜，使得产生之前确定的偏转角。

公开(公告)号：EP2388650B1

公开(公告)日：2013-11-20

申请号：EP11006781.6

申请日：2008-12-13

申请人： Carl Zeiss SMT GmbH

发明人： Schubert, Erich ,  Kohl, Alexander ,  Ziegler, Gerhard-Wilhelm ,  Patra, Michael ,  Degünther, Markus ,  Layh, Michael

IPC分类号： G03F7/20

CPC分类号： G03F7/70083 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70433

摘要： A diffractive optical element (156) is configured to be inserted into a light beam path of an illumination system (112) of a microlithographic projection exposure apparatus (10) such that it produces a desired intensity distribution in a system pupil surface (154) of the illumination system, wherein a Fourier transform of an angular distribution produced by the diffractive optical element (156) differs from the desired intensity distribution.

摘要翻译： 衍射光学元件（156）被配置为插入微光刻投影曝光设备（10）的照明系统（112）的光束路径中，使得其在系统光瞳表面（154）中产生期望的强度分布， 照明系统，其中由衍射光学元件（156）产生的角度分布的傅立叶变换不同于期望的强度分布。

公开(公告)号：EP2388649B1

公开(公告)日：2013-06-19

申请号：EP11006780.8

申请日：2008-12-13

申请人： Carl Zeiss SMT GmbH

发明人： Schubert, Erich ,  Kohl, Alexander ,  Ziegler, Gerhard-Wilhelm ,  Patra, Michael ,  Degünther, Markus ,  Layh, Michael

IPC分类号： G03F7/20

CPC分类号： G03F7/70083 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70433

摘要： A diffractive optical element (156) is configured to be inserted into a light beam path of an illumination system (112) of a microlithographic projection exposure apparatus (10) such that it produces a desired intensity distribution in a system pupil surface (154) of the illumination system, wherein a Fourier transform of an angular distribution produced by the diffractive optical element (156) differs from the desired intensity distribution.

公开(公告)号：EP2388650A1

公开(公告)日：2011-11-23

申请号：EP11006781.6

申请日：2008-12-13

申请人： Carl Zeiss SMT GmbH

发明人： Schubert, Erich ,  Kohl, Alexander ,  Ziegler, Gerhard-Wilhelm ,  Patra, Michael ,  Degünther, Markus ,  Layh, Michael

IPC分类号： G03F7/20

CPC分类号： G03F7/70083 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70433

摘要： A diffractive optical element (156) is configured to be inserted into a light beam path of an illumination system (112) of a microlithographic projection exposure apparatus (10) such that it produces a desired intensity distribution in a system pupil surface (154) of the illumination system, wherein a Fourier transform of an angular distribution produced by the diffractive optical element (156) differs from the desired intensity distribution.

摘要翻译： 衍射光学元件（156）被配置为插入到微光刻投影曝光设备（10）的照明系统（112）的光束路径中，使得其在系统光瞳表面（154）中产生期望的强度分布 所述照明系统，其中由所述衍射光学元件（156）产生的角度分布的傅里叶变换与期望的强度分布不同。