发明公开
EP2463046A1 Cu-Al ALLOY POWDER, ALLOY PASTE UTILIZING SAME, AND ELECTRONIC COMPONENT
审中-公开
CU-AL-LEGIERUNGSPULVER,LEGIERUNG SPASTE DAMIT UND ELEKTRONISCHES BAUTIIL
- 专利标题: Cu-Al ALLOY POWDER, ALLOY PASTE UTILIZING SAME, AND ELECTRONIC COMPONENT
- 专利标题(中): CU-AL-LEGIERUNGSPULVER,LEGIERUNG SPASTE DAMIT UND ELEKTRONISCHES BAUTIIL
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申请号: EP10806217.5申请日: 2010-08-02
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公开(公告)号: EP2463046A1公开(公告)日: 2012-06-13
- 发明人: KATO, Takahiko , NAITO, Takashi , AOYAGI, Takuya , YAMAMOTO, Hiroki , YOSHIDA, Masato , KATAYOSE, Mitsuo , TAKEDA, Shinji , TANAKA, Naotaka , ADACHI, Shuichiro
- 申请人: Hitachi Chemical Company, Ltd.
- 申请人地址: 1-1 Nishi-Shinjuku 2-chome Shinjuku-ku Tokyo 163-0449 JP
- 专利权人: Hitachi Chemical Company, Ltd.
- 当前专利权人: Hitachi Chemical Company, Ltd.
- 当前专利权人地址: 1-1 Nishi-Shinjuku 2-chome Shinjuku-ku Tokyo 163-0449 JP
- 代理机构: Beetz & Partner
- 优先权: JP2009182007 20090805
- 国际公布: WO2011016217 20110210
- 主分类号: B22F1/02
- IPC分类号: B22F1/02 ; H01B1/22 ; H01B5/00 ; H01J11/02 ; H01L21/28 ; H01L21/288 ; H01L21/3205 ; H01L23/52 ; H01L31/04 ; H05K1/09
摘要:
In an electronic component having a wiring and/or an electrode prepared through firing of a paste or in an electronic component having a wiring in contact with a glass or glass ceramic member, provided is an electronic component using a Cu-based wiring material which less suffers from increase in electric resistance due to oxidation, which less causes bubbles in the glass or glass ceramic, and has satisfactory migration resistance. The Cu-Al alloy powder includes a Cu-Al alloy powder including Cu and, preferably, 50 percent by weight or less of Al; and an aluminum oxide film having a thickness of 80 nm or less and being present on the surface of the Cu-Al alloy powder. The powder, when compounded with a glass or glass ceramic material to give a paste, can be used to form wiring (interconnections), electrodes, and/or contact members.
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