发明公开
EP2474538A1 CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN
有权
环状化合物，工艺FOR环状化合物，辐射敏感性组合物和方法形成抗蚀剂结构
- 专利标题： CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN
- 专利标题（中）： 环状化合物，工艺FOR环状化合物，辐射敏感性组合物和方法形成抗蚀剂结构
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申请号： EP10811965.2申请日： 2010-08-26
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公开(公告)号： EP2474538A1公开(公告)日： 2012-07-11
- 发明人: ECHIGO, Masatoshi , HAYASHI, Hiromi
- 申请人： Mitsubishi Gas Chemical Company, Inc.
- 申请人地址： 5-2, Marunouchi 2-chome Chiyoda-ku Tokyo 100-8324 JP
- 专利权人： Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人： Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人地址： 5-2, Marunouchi 2-chome Chiyoda-ku Tokyo 100-8324 JP
- 代理机构： HOFFMANN EITLE
- 优先权： JP2009200631 20090831
- 国际公布： WO2011024916 20110303
- 主分类号： C07D303/26
- IPC分类号： C07D303/26 ; G03F7/004 ; G03F7/038 ; H01L21/027 ; C07C39/15
摘要：
A cyclic compound represented by formula (1):
wherein L, R 1 , R', and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation- sensitive composition.
wherein L, R 1 , R', and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation- sensitive composition.
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