发明公开
EP2474565A4 CYCLIC COMPOUND, MANUFACTURING METHOD THEREFOR, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING A RESIST PATTERN
审中-公开
ZYKLISCHE VERBINDUNG，HERSTELLUNGSVERFAHRENDAFÜR，STRAHLUNGSEMPFINDLICHE ZUSAMMENSETZUNG UND VERFAHREN ZUR FORMUNG EINER RESISTSTRUKTUR
- 专利标题： CYCLIC COMPOUND, MANUFACTURING METHOD THEREFOR, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING A RESIST PATTERN
- 专利标题（中）： ZYKLISCHE VERBINDUNG，HERSTELLUNGSVERFAHRENDAFÜR，STRAHLUNGSEMPFINDLICHE ZUSAMMENSETZUNG UND VERFAHREN ZUR FORMUNG EINER RESISTSTRUKTUR
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申请号： EP10812016申请日： 2010-08-27
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公开(公告)号： EP2474565A4公开(公告)日： 2013-12-25
- 发明人: ECHIGO MASATOSHI , HAYASHI HIROMI
- 申请人： MITSUBISHI GAS CHEMICAL CO
- 专利权人： MITSUBISHI GAS CHEMICAL CO
- 当前专利权人： MITSUBISHI GAS CHEMICAL CO
- 优先权： JP2009200633 2009-08-31
- 主分类号： C08G8/32
- IPC分类号： C08G8/32 ; C07C69/21 ; G03F7/004 ; G03F7/038 ; H01L21/027
摘要：
A cyclic compound represented by formula (1): wherein L, R 1 , R', and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
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