发明授权
EP2490073B1 Substrate holder, lithographic apparatus, and method of manufacturing a substrate holder
有权
衬底保持器，对于一个衬底保持器的制备光刻设备和过程
- 专利标题： Substrate holder, lithographic apparatus, and method of manufacturing a substrate holder
- 专利标题（中）： 衬底保持器，对于一个衬底保持器的制备光刻设备和过程
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申请号： EP12151380.8申请日： 2012-01-17
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公开(公告)号： EP2490073B1公开(公告)日： 2015-09-23
- 发明人: Lafarre, Raymond , Ten Kate, Nicolaas , Dziomkina, Nina , Karade, Yogesh , Tromp, Siegfried, , Leijssen, Jacobus, , Rodenburg, Elisabeth, , Feijts, Maurice, , Huisman, Hendrik
- 申请人： ASML Netherlands BV
- 申请人地址： De Run 6501 5504 DR Veldhoven NL
- 专利权人： ASML Netherlands BV
- 当前专利权人： ASML Netherlands BV
- 当前专利权人地址： De Run 6501 5504 DR Veldhoven NL
- 代理机构： Dung, Shiang-Lung
- 优先权： US201161444483P 20110218; US201161477056P 20110419; US201161576627P 20111216
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A substrate holder (100) for a lithographic apparatus has a planarization layer (108) provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack (200) forming an electronic component. The thin film stack comprises an (optional) isolation layer (201), a metal layer (202) forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer (203).
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