公开(公告)号：EP2979135B1

公开(公告)日：2019-11-13

申请号：EP14708521.1

申请日：2014-02-26

申请人： ASML Netherlands B.V.

发明人： LAFARRE, Raymond ,  ACHANTA, Satish ,  FILIPPI, Matteo ,  KARADE, Yogesh ,  NELLISSEN, Antonius ,  VAN DER WILK, Ronald ,  VAN DOREMALEN, Hendrikus, Christoffel, Maria ,  WELTERS, Wilhelmus

IPC分类号： G03F7/20

公开(公告)号：EP3155481B1

公开(公告)日：2019-04-24

申请号：EP15721224.2

申请日：2015-05-07

申请人： ASML Netherlands B.V.

发明人： CORTIE, Rogier, Hendrikus, Magdalena ,  BERENDSEN, Christianus, Wilhelmus, Johannes ,  JEUNINK, Andre, Bernardus ,  KOEVOETS, Adrianus, Hendrik ,  OVERKAMP, Jim, Vincent ,  TROMP, Siegfried, Alexander ,  VY, Van, Vuong ,  AUDENAERDT, Daniel, Elza, Roeland

IPC分类号： G03F7/20

公开(公告)号：EP3387491A1

公开(公告)日：2018-10-17

申请号：EP16790343.4

申请日：2016-11-02

申请人： ASML Netherlands B.V.

发明人： VAN SOMMEREN, Daan Daniel Johannes Antonius ,  BALTIS, Coen Hubertus Matheus ,  BUDDENBERG, Harold Sebastiaan ,  GATTOBIGIO, Giovanni Luca ,  MELMAN, Johannes Cornelis Paulus ,  NAKIBOGLU, Günes ,  POLET, Theodorus Wilhelmus ,  STALS, Walter Theodorus Matheus ,  VAN DE VIJVER, Yuri Johannes Gabriël ,  VAN LIESHOUT, Josephus Peter ,  VIEYRA SALAS, Jorge Alberto ,  ZDRAVKOV, Aleksandar Nikolov

IPC分类号： G03F7/20

摘要： A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

公开(公告)号：EP2856262A1

公开(公告)日：2015-04-08

申请号：EP13723161.9

申请日：2013-05-17

申请人： ASML Netherlands B.V.

发明人： DONDERS, Sjoerd, Nicolaas, Lambertus ,  FIEN, Menno ,  HOOGENDAM, Christiaan, Alexander ,  HOUBEN, Martijn ,  JACOBS, Johannes, Henricus, Wilhelmus ,  KOEVOETS, Adrianus, Hendrik ,  LAFARRE, Raymond, Wilhelmus, Louis ,  OVERKAMP, Jim, Vincent ,  TEN KATE, Nicolaas ,  WESTERLAKEN, Jan, Steven, Christiaan ,  DE GROOT, Antonius, Franciscus, Johannes ,  VAN BEIJNUM, Maarten ,  DE JONG, Rob

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70733

摘要： A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

摘要翻译： 用于光刻设备的支撑设备具有物体保持器和物体保持器径向外侧的抽出体。 对象持有者被配置为支持对象。 提取体包括提取开口，其构造成从支撑装置的顶表面提取流体。 提取体与物体保持器间隔开，使得提取体基本上与物体保持器分离。 提取体包括突出部，其被构造为使得其围绕物体保持器并且使得在使用中，一层液体保持在突出部上并与支撑在物体保持器上的物体接触。

公开(公告)号：EP3510446A1

公开(公告)日：2019-07-17

申请号：EP17755209.8

申请日：2017-08-28

申请人： ASML Netherlands B.V.

发明人： VAN DEN EIJNDEN, Pepijn ,  ROPS, Cornelius Maria ,  POLET, Theodorus Wilhelmus ,  KEUKENS, Floor Lodewijk ,  TANASA, Gheorghe ,  CORTIE, Rogier Hendrikus Magdalena ,  CUYPERS, Koen ,  BUDDENBERG, Harold Sebastiaan ,  GATTOBIGIO, Giovanni Luca ,  VAN VLIET, Evert ,  TEN KATE, Nicolaas ,  FRENCKEN, Mark Johannes Hermanus ,  VAN ERVE, Jantien Laura ,  TEUNISSEN, Marcel Maria Cornelius Franciscus

IPC分类号： G03F7/20

公开(公告)号：EP3155482B1

公开(公告)日：2018-07-04

申请号：EP15723888.2

申请日：2015-05-12

申请人： ASML Netherlands B.V.

发明人： VAN BEUZEKOM, Aart, Adrianus ,  ALBERTI, Jozef, Augustinus, Maria ,  SEGERS, Hubert, Marie ,  VAN DER HAM, Ronald ,  FAHRNI, Francis ,  OLIESLAGERS, Ruud ,  PIETERSE, Gerben ,  ROPS, Cornelius, Maria ,  VAN DEN EIJNDEN, Pepijn ,  VAN DONGEN, Paul ,  WILLEMS, Bas

IPC分类号： G03F7/20

CPC分类号： G03F7/7075 ,  G03F7/70341 ,  G03F7/70991

摘要： A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

公开(公告)号：EP3213149A1

公开(公告)日：2017-09-06

申请号：EP15778638.5

申请日：2015-10-08

申请人： ASML Netherlands B.V.

发明人： VAN DE RIJDT, Johannes Hubertus Antonius

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70783 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709

摘要： A component for a lithography tool, the component including a member having a primary surface; a conduit defined within the member and configured to receive a fluid under pressure; a compressible region within the member and located between the conduit and the primary surface; and a deformable region between the compressible region and the conduit, wherein the compressible region and the deformable region are configured to accommodate local deformation of the member resulting from the pressure of the fluid.

摘要翻译： 一种用于光刻工具的部件，所述部件包括：·具有主表面（53）的构件（50）; ·导管（51），限定在所述构件内并构造成接收处于压力下的流体; ·构件内的可压缩区域（52a，52b），其位于导管和主表面之间; 以及·可压缩区域与导管之间的可变形区域（55） 其中所述可压缩区域和所述可变形区域构造成适应由所述流体的压力引起的所述构件的局部变形。

公开(公告)号：EP3155482A1

公开(公告)日：2017-04-19

申请号：EP15723888.2

申请日：2015-05-12

申请人： ASML Netherlands B.V.

发明人： VAN BEUZEKOM, Aart, Adrianus ,  ALBERTI, Jozef, Augustinus, Maria ,  SEGERS, Hubert, Marie ,  VAN DER HAM, Ronald ,  FAHRNI, Francis ,  OLIESLAGERS, Ruud ,  PIETERSE, Gerben ,  ROPS, Cornelius, Maria ,  VAN DEN EIJNDEN, Pepijn ,  VAN DONGEN, Paul ,  WILLEMS, Bas

IPC分类号： G03F7/20

CPC分类号： G03F7/7075 ,  G03F7/70341 ,  G03F7/70991

摘要： A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

摘要翻译： 一种光刻设备，包括：一个基片台，一后曝光处理模块，机器人处理基材和干燥站。 衬底台被配置为支持用于暴露于处理的基材。 曝光后处理模块，用于处理基材暴露后。 搬运机器人的基板是被配置为将基底从所述基底台沿着路径的基板卸载转移到后曝光处理模块。 干燥站被配置为主动地从衬底的表面除去液体。 干燥站位于基板卸载路径。干燥站位于后曝光处理模块。 曝光后处理模块可以是处理器的衬底。

公开(公告)号：EP2979135A2

公开(公告)日：2016-02-03

申请号：EP14708521.1

申请日：2014-02-26

申请人： ASML Netherlands B.V.

发明人： LAFARRE, Raymond ,  ACHANTA, Satish ,  FILIPPI, Matteo ,  KARADE, Yogesh ,  NELLISSEN, Antonius ,  VAN DER WILK, Ronald ,  VAN DOREMALEN, Hendrikus, Christoffel, Maria ,  WELTERS, Wilhelmus

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70708

摘要： A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.

摘要翻译： 制造对象保持器中的一种用于在光刻设备中使用的方法，所述对象保持器包括一个或多个电功能的部件，所述方法包括：使用复合结构，其包括载体片材从所述对象保持器的主体和层状结构的不同 包括一个或层上的多个和形成在载体片材上; 该复合结构连接到检查的主体的表面上未发现分层结构是所述载体片材和所述主体的所述表面之间; 及从该复合结构体的载体片材，留下连接到所述主体上的层状结构。

公开(公告)号：EP3391149A1

公开(公告)日：2018-10-24

申请号：EP16791368.0

申请日：2016-11-02

申请人： ASML Netherlands B.V.

发明人： NAKIBOGLU, Günes ,  BALTIS, Coen Hubertus Matheus ,  TROMP, Siegfried Alexander ,  VAN DE VIJVER, Yuri Johannes Gabriël ,  SCHOLTEN, Bert Dirk ,  VAN SOMMEREN, Daan Daniel Johannes Antonius ,  FRENCKEN, Mark Johannes Hermanus

IPC分类号： G03F7/20 ,  H01L21/683

摘要： A substrate holder (WT) for use in a lithographic apparatus and configured to support a substrate (W), the substrate holder comprising: • a main body (21) having a main body surface (22); • a plurality of burls (20) projecting from the main body surface to support the substrate spaced apart from the main body surface; and • a liquid control structure (200) provided in a peripheral region (22a) of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.