发明公开
- 专利标题: Inspection device using secondary charged particle detection
- 专利标题(中): 测试仪,基于所述检测充电二次粒子的
-
申请号: EP12001774.4申请日: 2012-03-15
-
公开(公告)号: EP2508903A3公开(公告)日: 2015-01-21
- 发明人: Hatakeyama, Masahiro , Yoshikawa, Shoji , Murakami, Takeshi , Watanabe, Kenji , Naito, Yoshihiko , Toma, Yasushi , Karimata, Tsutomu , Hayashi, Takehide , Tsukamoto, Kiwamu , Kohama, Tatsuya , Kobayashi, Noboru
- 申请人: EBARA CORPORATION
- 申请人地址: 11-1, Haneda Asahi-cho Ohta-ku, Tokyo JP
- 专利权人: EBARA CORPORATION
- 当前专利权人: EBARA CORPORATION
- 当前专利权人地址: 11-1, Haneda Asahi-cho Ohta-ku, Tokyo JP
- 代理机构: Carstens, Dirk Wilhelm
- 优先权: JP2011057312 20110315; JP2011105751 20110510; JP2012015875 20120127
- 主分类号: G01R31/305
- IPC分类号: G01R31/305 ; G01R31/308 ; H01J37/244 ; H01J37/252 ; H01J37/304 ; H01J37/26
摘要:
An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator (10000) which is capable of generating one of either charge particles or an electromagnetic wave as a beam (10000A), a primary optical system (72) which is capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system (74) which is capable of including a first movable numerical aperture (10008) and a first detector (761;76) which detects secondary charge particles generated from the inspection object (W), the secondary charge particles passing through the first movable numerical aperture, an image processing system (763) which is capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector (76-2) arranged between the first movable numerical aperture (10008) and the first detector (76) and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object (W).
公开/授权文献
- EP2508903B1 Inspection device using secondary charged particle detection 公开/授权日:2016-05-11
信息查询