公开(公告)号：EP2508903B1

公开(公告)日：2016-05-11

申请号：EP12001774.4

申请日：2012-03-15

申请人： EBARA CORPORATION

发明人： Hatakeyama, Masahiro ,  Yoshikawa, Shoji ,  Murakami, Takeshi ,  Watanabe, Kenji ,  Naito, Yoshihiko ,  Toma, Yasushi ,  Karimata, Tsutomu ,  Hayashi, Takehide ,  Tsukamoto, Kiwamu ,  Kohama, Tatsuya ,  Kobayashi, Noboru

IPC分类号： G01R31/305 ,  G01R31/308 ,  H01J37/244 ,  H01J37/252 ,  H01J37/304 ,  H01J37/26

CPC分类号： H01J37/09 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

公开(公告)号：EP2587515A1

公开(公告)日：2013-05-01

申请号：EP13000328.8

申请日：2001-06-27

申请人： EBARA CORPORATION ,  Kabushiki Kaisha Toshiba

发明人： Nakasuji, Mamoru ,  Noji, Nobuharu ,  Satake, Tohru ,  Hatakeyama, Masahiro ,  Kimba, Toshifumi ,  Sobukawa, Hirosi ,  Yoshikawa, Shoji ,  Murakami, Takeshi ,  Watanabe, Kenji ,  Karimata, Tsutomu ,  Oowada, Shin ,  Saito, Mutsumi ,  Yamazaki, Yuichiro ,  Nagai, Takamitsu ,  Nagahama, Ichirota

IPC分类号： H01J37/063 ,  H01J37/29 ,  H01L21/027 ,  H01L21/66 ,  G03F1/86

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; ; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 在包括由电子束检查装置70具有为电子 - 光学系统，用于从在电子束源与一次电子束照射物体的电子光学器件，和用电子投射用于检测所述二次电子图像检测器 光学系统; 用于保持和相对于电子光学系统中的物体移动的阶段系统50; 用于供给清洁气体至该物体，以防止接触到物体灰尘微环境腔室20; 用于容纳所述载物台装置的工作室31，工作腔室是可控制的，以便具有一个真空气氛; 至少两个装载室41，42中的微环境腔和工作腔，angepasst之间布置成unabhängig可控的，从而有一个真空气氛; ; 和用于传递环装载机60通过装载室中的对象到载置台系统。

公开(公告)号：EP2508903A3

公开(公告)日：2015-01-21

申请号：EP12001774.4

申请日：2012-03-15

申请人： EBARA CORPORATION

发明人： Hatakeyama, Masahiro ,  Yoshikawa, Shoji ,  Murakami, Takeshi ,  Watanabe, Kenji ,  Naito, Yoshihiko ,  Toma, Yasushi ,  Karimata, Tsutomu ,  Hayashi, Takehide ,  Tsukamoto, Kiwamu ,  Kohama, Tatsuya ,  Kobayashi, Noboru

IPC分类号： G01R31/305 ,  G01R31/308 ,  H01J37/244 ,  H01J37/252 ,  H01J37/304 ,  H01J37/26

CPC分类号： H01J37/09 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

摘要： An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator (10000) which is capable of generating one of either charge particles or an electromagnetic wave as a beam (10000A), a primary optical system (72) which is capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system (74) which is capable of including a first movable numerical aperture (10008) and a first detector (761;76) which detects secondary charge particles generated from the inspection object (W), the secondary charge particles passing through the first movable numerical aperture, an image processing system (763) which is capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector (76-2) arranged between the first movable numerical aperture (10008) and the first detector (76) and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object (W).

公开(公告)号：EP2522992A3

公开(公告)日：2013-12-04

申请号：EP12005826.8

申请日：2004-04-26

申请人： Ebara Corporation

发明人： Nobuharu, Noji ,  Satake, Tohru ,  Sobukawa, Hirosi ,  Kimba, Toshifumi ,  Hatakeyama, Masahiro ,  Yoshikawa, Shoji ,  Murakami, Takeshi ,  Watanabe, Kenji ,  Karimata, Tsutomu ,  Suematsu, Kenichi ,  Tabe, Yutaka ,  Tajima, Ryo ,  Tohyama, Keiichi

IPC分类号： G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J37/29

CPC分类号： G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2817

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 2·1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25·11.

公开(公告)号：EP2522992A2

公开(公告)日：2012-11-14

申请号：EP12005826.8

申请日：2004-04-26

申请人： Ebara Corporation

发明人： Nobuharu, Noji ,  Satake, Tohru ,  Sobukawa, Hirosi ,  Kimba, Toshifumi ,  Hatakeyama, Masahiro ,  Yoshikawa, Shoji ,  Murakami, Takeshi ,  Watanabe, Kenji ,  Karimata, Tsutomu ,  Suematsu, Kenichi ,  Tabe, Yutaka ,  Tajima, Ryo ,  Tohyama, Keiichi

IPC分类号： G01N23/225 ,  H01J37/28 ,  H01L21/66

CPC分类号： G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2817

摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 2·1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25·11.

摘要翻译： 一种用于进一步提高速度，即系统 改善的SEM型检查装置可以通过被提供。 用于检查基板的表面的检查装置生成从电子束源2·1发射的电子交叉，然后在试样W以产生交叉的方向上的期望倍率下形成图像。 当交叉通过，电子作为噪声被从交叉除去与孔径其中调节以使没有交叉变为平行电子束照射基片在所期望的截面形状。产生检查的电子束没有凹凸 照度为10％或更小。 从试样W放出的电子由检测器25·11检测到的

公开(公告)号：EP2365512A2

公开(公告)日：2011-09-14

申请号：EP11004165.4

申请日：2001-06-27

申请人： EBARA CORPORATION ,  Kabushiki Kaisha Toshiba

发明人： Nakasuji, Mamoru ,  Noji, Nobuharu ,  Satake, Toru ,  Hatakeyama, Masahiro ,  Kimba, Toshifumi ,  Sobukawa, Hirosi ,  Yoshikawa, Shoji ,  Murakami, Takeshi ,  Watanabe, Kenji ,  Karimata, Tsutomu ,  Oowada, Shin ,  Saito, Mutsumi ,  Yamazaki, Yuichiro ,  Nagai, Takamitsu ,  Nagahama, Ichirota

IPC分类号： H01J37/063 ,  H01J37/29 ,  H01L21/027 ,  H01L21/66 ,  H01L21/677

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; ; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 电子束的检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子光学系统;以及用于检测由电子束投影的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳舞台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; ; 以及用于通过装载室将物体传送到舞台系统的装载器60。

公开(公告)号：EP1936953A3

公开(公告)日：2009-12-30

申请号：EP08007124.4

申请日：2002-05-14

申请人： EBARA CORPORATION

发明人： Hatakeyama, Masahiro ,  Satake, Tohru ,  Murakami, Takeshi ,  Watanabe, Kenji ,  Noji, Nobuharu

IPC分类号： H04N3/15 ,  H01J37/26 ,  G01N21/956 ,  H01R13/00 ,  H01J37/22 ,  H01J37/244 ,  H01R13/24 ,  H04N5/225

CPC分类号： H01J37/222 ,  G01N21/956 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/2445 ,  H01J2237/2447 ,  H01R13/2421 ,  H04N5/2253 ,  Y10S439/935

摘要： An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which the pin 52, the other pin 53 and the socket contact 54 together construct a connecting block, and the socket contact 54 has an elastic member 61. Accordingly, even if a large number of connecting blocks are provided, the connecting force may be kept to such a low level as to prevent the breakage in the sensor. The pin 53 is connected with the TDI sensor 64, in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system to as small as possible so that a maximal acceptable distortion within the field of view may be set larger. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.

公开(公告)号：EP2508903A2

公开(公告)日：2012-10-10

申请号：EP12001774.4

申请日：2012-03-15

申请人： EBARA CORPORATION

发明人： Hatakeyama, Masahiro ,  Yoshikawa, Shoji ,  Murakami, Takeshi ,  Watanabe, Kenji ,  Naito, Yoshihiko ,  Toma, Yasushi ,  Karimata, Tsutomu ,  Hayashi, Takehide ,  Tsukamoto, Kiwamu ,  Kohama, Tatsuya ,  Kobayashi, Noboru

IPC分类号： G01R31/305 ,  G01R31/308 ,  H01J37/244 ,  H01J37/252 ,  H01J37/304

CPC分类号： H01J37/09 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

摘要： An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator (10000) which is capable of generating one of either charge particles or an electromagnetic wave as a beam (10000A), a primary optical system (72) which is capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system (74) which is capable of including a first movable numerical aperture (10008) and a first detector (761;76) which detects secondary charge particles generated from the inspection object (W), the secondary charge particles passing through the first movable numerical aperture, an image processing system (763) which is capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector (76-2) arranged between the first movable numerical aperture (10008) and the first detector (76) and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object (W).

摘要翻译： 用于使用光束检查检查对象的表面的检查装置包括能够产生作为光束（10000A）的电荷粒子或电磁波之一的光束发生器（10000），主光学系统（72），其 能够将梁引导和照射到支撑在工作室内的检​​查对象物，能够包括第一可移动数值孔径（10008）和第二检测器（761; 76）的辅助光学系统（74），其检测次级 从检查对象（W）产生的充电微粒，通过第一可移动数值孔径的二次电荷粒子，能够基于由第一检测器检测的二次电荷粒子形成图像的图像处理系统（763） 以及布置在所述第一可移动数值孔径（10008）和所述第一检测器（76）之间的第二检测器（76-2），并且检测在从所述检查对象（W）产生的所述次级电荷颗粒的交叉位置处的位置和形状 ）。

公开(公告)号：EP2557416A2

公开(公告)日：2013-02-13

申请号：EP12007216.0

申请日：2003-04-17

申请人： Ebara Corporation

发明人： Hatakeyama, Masahiro ,  Watanabe, Kenji ,  Murakami, Takeshi ,  Satake, Tohru ,  Noji, Nobuharu

IPC分类号： G01N23/227 ,  H01L21/66 ,  H01J37/28

CPC分类号： G03F7/162 ,  G01N23/225 ,  H01J37/285 ,  H01J2237/204 ,  H01J2237/2812 ,  H01J2237/2814 ,  H01J2237/2855 ,  H01J2237/2857

摘要： The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the surface of the sample. In the surface inspection method of the present invention, a resistive film having an arbitrarily determined thickness t1 is first coated on a surface of a sample. Thereafter, a part of the resistive film having the arbitrarily determined thickness t1 is dissolved in a solvent, to thereby reduce the thickness of the resistive film to a desired level. This enables precise control of a value of resistance of the resistive film and suppresses distortion of an image to be detected.

摘要翻译： 本发明提供一种用于检查样品表面的表面检查方法和设备，其中电阻膜被涂覆在表面上，并且光束被照射到其上涂覆有电阻膜的表面上，从而检查 样品的表面。 在本发明的表面检查方法中，首先将具有任意确定的厚度t1的电阻膜涂覆在样品的表面上。 此后，将具有任意确定的厚度t1的电阻膜的一部分溶解在溶剂中，由此将电阻膜的厚度减小到期望的水平。 这使得能够精确地控制电阻膜的电阻值并抑制待检测图像的失真。

公开(公告)号：EP1936953A2

公开(公告)日：2008-06-25

申请号：EP08007124.4

申请日：2002-05-14

申请人： EBARA CORPORATION

发明人： Hatakeyama, Masahiro ,  Satake, Tohru ,  Murakami, Takeshi ,  Watanabe, Kenji ,  Noji, Nobuharu

IPC分类号： H04N3/15

CPC分类号： H01J37/222 ,  G01N21/956 ,  H01J37/224 ,  H01J37/244 ,  H01J2237/2445 ,  H01J2237/2447 ,  H01R13/2421 ,  H04N5/2253 ,  Y10S439/935

摘要： An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which the pin 52, the other pin 53 and the socket contact 54 together construct a connecting block, and the socket contact 54 has an elastic member 61. Accordingly, even if a large number of connecting blocks are provided, the connecting force may be kept to such a low level as to prevent the breakage in the sensor. The pin 53 is connected with the TDI sensor 64, in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system to as small as possible so that a maximal acceptable distortion within the field of view may be set larger. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.

摘要翻译： 一种电子束装置包括TDI传感器64和一个馈通装置50的馈通装置具有用于分离不同的环境中，而另一个销53使一对具有互连附接至凸缘51的销52的插座接触件54 销52，其中销52，另一销53与插座触点54共同构成一个连接块，和插座接触件54具有弹性件61上。因此，即使提供大量的连接块，所述 连接力可被保持为低电平作为谋求防止传感器破损。 该销53与TDI传感器64，其中，一个像素阵列被配置为基于图像投影光学系统的光学特性自适应地连接，即传感器具有多个积分级的也可以减少视图的图像的场 投影光学系统，以尽可能小的所以没有的视野内的最大可接受失真可被设定得较大。 此外，可确定开采检查积分级的数目也TDI传感器的数据速率将不会减少，但引脚的数量将不增加尽可能。 优选地，行计数的数量可以几乎等于积分级的数量。