发明公开
EP2520622A1 Method for forming chalcogenide semiconductor film and photovoltaic device 审中-公开
Verfahren zum Formen von Chalkogenid-Halbleiterfolie und Photovoltaikvorrichtung

Method for forming chalcogenide semiconductor film and photovoltaic device
摘要:
A method for forming a chalcogenide semiconductor film (1220) and a photovoltaic device using the chalcogenide semiconductor film (1220) are disclosed. The method includes steps of coating a precursor solution to form a layer on a substrate and annealing the layer to form the chalcogenide semiconductor film (1220). The precursor solution includes a solvent (220, 420), metal chalcogenide nanoparticles (210, 310, 410) and at least one of metal ions (240, 340, 450) and metal complex ions (240, 330, 440) which are distributed on surfaces of the metal chalcogenide nanoparticles (210, 310, 410). The metals of the metal chalcogenide nanoparticles (210, 310, 410), the metal ions (240, 340, 450) and the metal complex ions (240, 330, 440) are selected from a group consisting of group I, group II, group III and group IV elements of the periodic table and include all metal elements of a chalcogenide semiconductor material.
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