发明公开
EP2527785A1 Method and device for flatness measurement 审中-公开
Verfahren und Vorrichtung zur Ebenheitsmessung

Method and device for flatness measurement
摘要:
The invention relates to a device and method for flatness measurement of a surface wherein the device comprises a frame, at least one distance sensor connected to the frame, a control unit for the at least one distance sensor and a data processing unit for processing data from the at least one distance sensor. The deviation of flatness is determined by taking a number of measurements over a certain length and determining maximum variation from a straight line.
信息查询
0/0