Method and device for flatness measurement
    1.
    发明公开
    Method and device for flatness measurement 审中-公开
    Verfahren und Vorrichtung zur Ebenheitsmessung

    公开(公告)号:EP2527785A1

    公开(公告)日:2012-11-28

    申请号:EP11004191.0

    申请日:2011-05-20

    发明人: Milling, Oliver

    CPC分类号: G01B11/306

    摘要: The invention relates to a device and method for flatness measurement of a surface wherein the device comprises a frame, at least one distance sensor connected to the frame, a control unit for the at least one distance sensor and a data processing unit for processing data from the at least one distance sensor. The deviation of flatness is determined by taking a number of measurements over a certain length and determining maximum variation from a straight line.

    摘要翻译: 本发明涉及一种用于表面的平坦度测量的装置和方法,其中装置包括框架,连接到框架的至少一个距离传感器,用于至少一个距离传感器的控制单元和用于处理数据的数据的数据处理单元 所述至少一个距离传感器。 通过在一定长度上进行多次测量并确定与直线的最大变化来确定平坦度的偏差。