发明公开
- 专利标题： BESCHICHTUNGSVORRICHTUNG MIT EINER HIPIMS-LEISTUNGSQUELLE
- 专利标题（英）： Coating apparatus having a hipims power source
- 专利标题（中）： 有电源涂布装置HIPIMS
-
申请号： EP11701627.9申请日： 2011-01-27
-
公开(公告)号： EP2529386A1公开(公告)日： 2012-12-05
- 发明人: PAPA, Frank , TIETEMA, Roel , KALAND, Anthonie
- 申请人： Hauzer Techno Coating BV
- 申请人地址： Van Heemskerkweg 22 5928 LL Venlo NL
- 专利权人： Hauzer Techno Coating BV
- 当前专利权人： Hauzer Techno Coating BV
- 当前专利权人地址： Van Heemskerkweg 22 5928 LL Venlo NL
- 代理机构： Manitz, Finsterwald & Partner GbR
- 优先权： DE202010001497U 20100129
- 国际公布： WO2012089286 20120705
- 主分类号： H01J37/36
- IPC分类号： H01J37/36
摘要：
A coating apparatus having a vacuum chamber, a plurality of cathodes arranged therein and also a HIPIMS power source is distinguished in that, in addition to at least one coating cathode which can be operated by the HIPIMS power source, a plurality of etching cathodes which have a smaller surface area than the coating cathode are provided, it being possible to connect said etching cathodes to the HIPIMS power source in a prespecified or prespecifiable order.
信息查询
