发明公开
EP2565713A3 Binary silica-titania glass articles having a ternary doped silica-titania critical zone
审中-公开
二氧化硅 - 钛二进制玻璃制品掺杂三元临界二氧化硅 - 钛区
- 专利标题: Binary silica-titania glass articles having a ternary doped silica-titania critical zone
- 专利标题(中): 二氧化硅 - 钛二进制玻璃制品掺杂三元临界二氧化硅 - 钛区
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申请号: EP12182315.7申请日: 2012-08-30
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公开(公告)号: EP2565713A3公开(公告)日: 2015-04-15
- 发明人: Annamalai, Sezhian
- 申请人: Corning Incorporated
- 申请人地址: 1 Riverfront Plaza Corning, New York 14831 US
- 专利权人: Corning Incorporated
- 当前专利权人: Corning Incorporated
- 当前专利权人地址: 1 Riverfront Plaza Corning, New York 14831 US
- 代理机构: Oldroyd, Richard Duncan
- 优先权: US201161529517P 20110831
- 主分类号: G03F1/22
- IPC分类号: G03F1/22 ; G03F1/00 ; B82Y10/00 ; B82Y40/00
摘要:
In one aspect the disclosure is directed to a binary silica-titania blank having a CTE of 0 ± 30 ppb/°C or less and a insert made of silica-titania-dopant(s) glass in the critical zone, wherein the dopants are selected from the group consisting of aluminum oxide, selected transition metal oxides, and amount of the dopants is in the range of 0.05 wt.% to 8 wt.% and the insert is fusion bonded to the blank with or without a frit. In various embodiments the dopants are selected from the group consisting of 0.25 wt.% to 8 wt.% Al 2 O 3 , 0.05 wt.% to 3 wt.% Nb 2 O 5 , and 0.25 wt.% to 6 wt.% Ta 2 O 5 .
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