发明公开
EP2602057A4 LARGE SUBSTRATE, AND POLISHING METHOD OF LARGE SUBSTRATE FOR UNIFORM POLISHING
审中-公开
GROSSES SUBSTRAT UND POLIERVERFAHREN DES GROSSEN SUBSTRATSFÜREINFÖRMIGESPOLIEREN
- 专利标题： LARGE SUBSTRATE, AND POLISHING METHOD OF LARGE SUBSTRATE FOR UNIFORM POLISHING
- 专利标题（中）： GROSSES SUBSTRAT UND POLIERVERFAHREN DES GROSSEN SUBSTRATSFÜREINFÖRMIGESPOLIEREN
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申请号： EP11814815申请日： 2011-08-01
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公开(公告)号： EP2602057A4公开(公告)日： 2017-07-05
- 发明人: MIN KYOUNG-HOON , IM YE-HOON , LEE DAE-YEON , SONG JAE-IK , PARK SU-CHAN
- 申请人： LG CHEMICAL LTD
- 专利权人： LG CHEMICAL LTD
- 当前专利权人： LG CHEMICAL LTD
- 优先权： KR20100074710 2010-08-02
- 主分类号： B24B7/20
- IPC分类号： B24B7/20 ; B24B37/005 ; B24B37/04 ; B24B49/00 ; H01L21/304
摘要：
Disclosed is a substrate polishing method capable of minimizing a difference of polishing amounts between a center portion and a rim portion of a large scale plate during a plate polishing process.
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